Feeding device with clean vacuum environment

A technology of a feeding device and a vacuum environment, applied in the field of feeding equipment, can solve the problems of time-consuming, the feeding cylinder cannot be made very large, and the operation steps are many, and the purification space is small, the purification time is saved, and the effect of automation is realized.

Pending Publication Date: 2022-03-18
TDG MACHINERY TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Due to production needs, the upper chamber cannot be made too large, and the feeding cylinder cannot be made too large in the upper chamber. The amount of feeding will not be large each time, but the total amount of feeding needs to be large, so the above feeding process needs to be repeated many times. Many steps and time-consuming

Method used

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  • Feeding device with clean vacuum environment
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Embodiment Construction

[0032] The core of the present invention is to provide a feeding device in a clean vacuum environment. The feeding device in a clean vacuum environment can perform unified feeding, and can complete the required feeding amount at one time, and can be purified uniformly. The purification space is small, the purification time is saved, and automation is realized. .

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0034] In a specific embodiment, the feeding device of the clean vacuum environment provided by t...

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Abstract

The invention discloses a clean vacuum environment feeding device which comprises a feeding tank (3), the feeding volume of the feeding tank (3) is larger than or equal to that of a furnace body (1) to be fed, the feeding tank (3) is provided with a feeding port in butt joint with a feeding port of the furnace body (1) to be fed, the feeding tank (3) is detachably connected with the furnace body (1) to be fed, and the feeding port of the furnace body (1) to be fed is in butt joint with the feeding port of the furnace body (1) to be fed. A feeding port is formed in the feeding tank (3), a feeding isolation valve (31) is arranged at the feeding port, a feeding isolation valve (11) is arranged at the feeding port of the to-be-fed furnace body (1), the feeding tank (3) and the to-be-fed furnace body (1) are each provided with a vacuum connector and a gas replacement connector, and the vacuum connectors and the gas replacement connectors are each provided with a purification isolation valve. According to the feeding device for the clean vacuum environment, unified feeding can be conducted, the needed feeding amount and unified purification can be completed at a time, the purification space is small, the purification time is saved, and automation is achieved.

Description

technical field [0001] The invention relates to the technical field of feeding equipment, in particular to a feeding device in a clean vacuum environment. Background technique [0002] The existing charging device includes the steps of adding a barrel of material to the furnace body to be charged: charging, purifying, feeding, and pulling out. Purification means that many raw materials need to exist in an environment that is isolated from certain gases, such as an oxygen-free environment, or a vacuum environment. The purification process often requires vacuuming and switching with inert gases. An isolating valve is provided at the feed port at the upper end of the furnace body to be fed. The isolating valve can isolate the two cavities in the closed state, and can connect the two cavities in the open state. Different chambers have different pressures and atmospheres due to different processes. When necessary, they are sometimes connected, and sometimes they are not connect...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F27D3/00F27D7/06
CPCF27D3/0084F27D7/06F27D2007/066
Inventor 苏晓良杨晓红周杰
Owner TDG MACHINERY TECH
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