Image Generation Method for Irregular Hole Morphology Defects

A technology for image generation and irregularity, which is applied in image analysis, image data processing, optical test flaws/defects, etc. It can solve the problems of hole shape defects that have not been touched by anyone, and are different, so as to shorten the online cycle and model iteration cycle. Reduce the iteration cycle and ensure the effect of stability

Active Publication Date: 2022-07-08
聚时科技(江苏)有限公司
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  • Summary
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AI Technical Summary

Problems solved by technology

The method of defect image generation has been studied by some people (the design methods of different defects are different), but no one has been involved in the hole shape defects in semiconductor defect inspection.

Method used

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  • Image Generation Method for Irregular Hole Morphology Defects
  • Image Generation Method for Irregular Hole Morphology Defects
  • Image Generation Method for Irregular Hole Morphology Defects

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] 1. Randomly select a normal image from the project dataset as the background image generated by the defect, such as image 3 shown.

[0047] 2. Randomly sample the coordinate points in the set area as the center of the circle, and use the distance r as the radius to define a circle as the area where the hole shape defects are generated, such as Figure 4 shown. Randomly select n pixel coordinate points ... in the picture as the bottom area contour points, where the positions of each point are respectively. ....., as in Figure 5 shown.

[0048] 3. Fit the bottom region contour points randomly selected in the previous step with the Bezier curve method, and randomly select the shape factor K of the curve, where K belongs to [0.2, 0.6]. The current K value is 0.3, and you get a value such as Image 6 The closed irregular circle in , the circularity of its contour area is greater than 0.5.

[0049] 4. The closed irregular circle generated in step 3 is defined as the b...

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Abstract

The invention belongs to the technical field of machine vision detection, and in particular relates to a method for generating an irregular hole shape defect image, comprising: selecting a defect-free image as a background image, randomly generating two closed irregular circles on the background image, two non-defective The regular circles are nested, and the two irregular circles are filled with different colors. This method uses an algorithm to randomly and quickly generate a large number of defect samples in the form of holes, which can quickly improve the detection effect of the deep learning model in a short period of time and greatly reduce the iteration cycle of the algorithm.

Description

technical field [0001] The invention belongs to the technical field of machine vision detection, and in particular relates to a method for generating irregular hole shape defect images. Background technique [0002] At present, in the semiconductor defect detection project, two methods of traditional image processing or deep learning are generally used for detection. Among them, traditional image processing requires manual design rules, and developers must have a deep understanding of defects, which also leads to problems such as weak robustness of design rules and difficulties in actual development. The development of deep learning algorithms makes it unnecessary to manually design features and repeatedly adjust parameters, but the effect of defect detection depends on a large number of defect sample data sets. The accuracy and robustness of the model are not ideal, which seriously affects the actual project progress. For a new product, because the defect image data canno...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06T7/187G06T7/90G01N21/95G06T7/00G06T7/181
CPCY02P90/30
Inventor 彭仁杰
Owner 聚时科技(江苏)有限公司
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