Double-cavity system and equipment for chemical vapor deposition diamond

Abstract

The invention relates to a double-cavity system and equipment for chemical vapor deposition diamond, which comprises a first cavity, a second cavity, a vacuum gate valve and a material transportation mechanism, the vacuum gate valve is fixedly connected with one end of the second cavity and the first cavity, and the material transportation mechanism is connected with the other end of the second cavity. And the material conveying mechanism can telescopically move in the first cavity and the second cavity. According to the double-cavity system for the chemical vapor deposition diamond, the technical defect that in the prior art, when a cabin door of the reaction cavity is opened and closed for multiple times to conduct lattice defect removal operation, water vapor and other impurity gases in air are promoted to be introduced into the reaction cavity can be overcome, and growth of the high-quality diamond is achieved.

Description

technical field

[0001] The invention belongs to the technical field of diamond growth, and in particular relates to a dual-chamber system for chemical vapor deposition of diamond and equipment including the dual-chamber system for chemical vapor deposition of diamond. Background technique

[0002] This section provides background information related to the present application only and is not necessarily prior art.

[0003] In the process of diamond growth by chemical vapor deposition, the reaction chamber needs to be evacuated first, and then the reaction gas is introduced. Under the action of the electromagnetic field generated by microwaves, the electrons in the chamber collide with each other and produce violent oscillations, which promote The collision between other atoms, groups and molecules in the reaction chamber is prevented, so that the chamber is filled with supersaturated atomic hydrogen and carbon-containing groups, and these groups are constantly adsorbing, des...

Images