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Complex background image defect detection method based on frequency domain template matching

A template matching and complex background technology, which is applied in image analysis, image data processing, character and pattern recognition, etc., can solve the problems of poor adaptability, high similarity between templates and sample images, and improve adaptability and robustness Effect

Pending Publication Date: 2022-04-08
WUXI SHANGSHI ELECTRONICS TECH
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Problems solved by technology

Although this method is relatively simple and has a certain detection effect on complex line images, which meets the detection requirements of actual industrial production, its adaptability is poor and the similarity between the template and the sample image requires high requirements.

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  • Complex background image defect detection method based on frequency domain template matching
  • Complex background image defect detection method based on frequency domain template matching
  • Complex background image defect detection method based on frequency domain template matching

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Embodiment Construction

[0032] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0033] A method for detecting defects in complex background images based on frequency-domain template matching mainly includes frequency-domain template matching and frequency-domain saliency detection. The overall method flow chart is as follows. figure 1 shown:

[0034] The overall method steps are as follows:

[0035] Step 1: Acquire a template image and a sample image in sequence.

[0036] Step 2: The image is subjected to a two...

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Abstract

The invention relates to the technical field of defect detection application in computer vision, in particular to a complex background image defect detection method based on frequency domain template matching. Comprising the following steps: A, converting a template image and a sample image into a frequency domain for matching, and respectively converting the matched frequency domain images of the template image and the sample image into a polar coordinate system for screening abnormal frequency components, performing polar coordinate system inverse transformation and Fourier inverse transformation on the abnormal frequency component in the sample image to obtain a candidate region 1; step B, performing frequency domain saliency detection on the frequency domain image of the sample image to obtain a saliency region, and removing background frequency components in the saliency region to obtain a candidate region 2; c, taking an intersection of the candidate region 1 and the candidate region 2, and performing inverse Fourier transform to obtain a defect region; the adaptability and robustness of the template matching method are improved, and the use requirements for the template and the sample image are reduced.

Description

technical field [0001] The invention relates to the technical field of defect detection application in computer vision, in particular to a complex background image defect detection method based on frequency domain template matching. Background technique [0002] In recent years, Liquid Crystal Display (LCD) has rapidly replaced the traditional Cathode Ray Tube (CRT) with its advantages of being light, thin, high-definition and non-radiation, and has become the current smartphone, tablet, notebook computer and TV. The mainstream screen for almost all electronic product display functions. Etching technology, as a technology for selectively etching or stripping the surface of a semiconductor substrate or a surface covering film according to the mask pattern or design requirements, is not only the basic manufacturing process of semiconductor devices and integrated circuits, but also applied to thin-film circuits, Processing of printed circuits and other fine patterns. With the...

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Application Information

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IPC IPC(8): G06T7/00G06K9/62G06V10/75G06V10/25
Inventor 贾磊夏衍刘广军
Owner WUXI SHANGSHI ELECTRONICS TECH
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