Photomask box with anti-collision gap structure
A photomask and gap technology, which is applied in the direction of optics, optomechanical equipment, photoplate making process of pattern surface, etc., can solve problems affecting product quality, etc.
Pending Publication Date: 2022-04-12
GUDENG PRECISION IND CO LTD
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Problems solved by technology
[0002] In the current EUV (Extreme Ultraviolet) process, the photomask needs to use a photomask box to protect the photomask during transportation and storage, so as to prevent particles from impacting or friction from affecting the cleanliness of the photomask. affect the final product quality
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[0038] The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which certain exemplary embodiments are shown by way of illustration. However, claimed subject matter may be embodied in many different forms, and thus constructions of covered or claimed subject matter are not limited to any example embodiments disclosed in this specification; the example embodiments are merely illustrations. Likewise, the invention resides in providing a reasonably broad scope for claimed subject matter as claimed or covered. Among other things, for example, claimed subject matter may be embodied as a method, apparatus, or system. Thus, embodiments may take the form of, for example, hardware, software, firmware or any combination of these (known not to be software).
[0039] The term "an embodiment" used in this specification does not necessarily refer to the same embodiment, and the use of "other(s / certain) embodiments" in this specific...
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Abstract
The invention provides a photomask box with an anti-collision gap structure. The photomask box is used for accommodating a photomask. The photomask box comprises a base and a plurality of supporting devices. The supporting device is arranged on the base and supports the photomask, a first gap is formed between a peripheral area of a bottom surface of the photomask and an upward top surface of the base, a second gap is formed between a central area of the bottom surface of the base and the upward top surface of the base, the central area is surrounded by the peripheral area, and the second gap is formed between the central area and the upward top surface of the base. The second gap is larger than the first gap. According to the photomask box, the first gap and the second gap are formed, so that the probability that the photomask is impacted or scratched in the interaction process of the photomask and the base is reduced, the photomask is protected, and due to the configuration of the first gap and the second gap, the photomask is prevented from being damaged. Therefore, when the photomask is taken up from the base, serious airflow disturbance is not easy to cause, so that particles are attached to the bottom surface of the photomask, and the pattern area of the photomask is protected from being polluted.
Description
technical field [0001] The invention relates to a technique for preventing the photomask from being damaged due to collision or scratching between the photomask and the base of the photomask box, and protecting the photomask box of the photomask. Background technique [0002] In the current EUV (Extreme Ultraviolet) process, the photomask needs to use a photomask box to protect the photomask during transportation and storage, so as to prevent particles from impacting or friction from affecting the cleanliness of the photomask. This in turn affects the quality of the final product. [0003] In order to prevent the photomask from being contaminated, the photomask needs to be stably fixed to the photomask to avoid damage caused by friction or displacement of the photomask in the photomask, so the contact between the photomask and the photomask The area should be as small as possible to avoid damage caused by contact or friction between the photomask and the fixture or support ...
Claims
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IPC IPC(8): H01L21/673
CPCG08C17/02H01L21/67389H01L21/67393H01L21/67363G03F7/7075G03F7/7085G03F7/70866G03F1/66G03F7/70975H01L21/6735H01L21/67242H01L21/67396H01L21/67359G03F7/70741H01L21/67369H01L21/67383H05K5/0034H05K5/0208
Inventor 邱铭乾庄家和李怡萱温星闵薛新民
Owner GUDENG PRECISION IND CO LTD