Method and system for detecting device defects using x-ray

A detection system, X-ray technology, applied in the direction of material analysis using radiation, material analysis using wave/particle radiation, radiation intensity measurement, etc., can solve the problem of slow integrated circuit detection, lack of resolution and imaging speed of X-ray systems And other issues

Pending Publication Date: 2022-04-29
BRUKER NANO INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, existing X-ray systems lack sufficient resolution and imaging speed to meet the needs of high-resolution, high-throughput IC and electronic package inspection
For example, traditional computed tomography (CT) using X-rays may take multiple X-ray image slices of the inspected object and use a large number of slices to build a 3D model of the object, so it is very slow and unsuitable for IC inspection

Method used

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  • Method and system for detecting device defects using x-ray
  • Method and system for detecting device defects using x-ray
  • Method and system for detecting device defects using x-ray

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Embodiment Construction

[0021] Automatic high-speed X-ray inspection system

[0022] X-ray system frame

[0023] The systems and methods disclosed herein relate to a system or use of a system that illuminates an object to be inspected or inspected with X-rays that convert the X-rays into visible (or near-visible) photons, forming visible (or near-visible) photons images, and then convert the images into electronic form.

[0024] Accordingly, various embodiments of the X-ray imaging system will be described first, followed by various embodiments of methods and systems utilizing the X-ray imaging system.

[0025] Although a wide variety of objects may be inspected or inspected using the apparatus disclosed herein, it is contemplated that it is particularly applicable to the inspection and inspection of integrated circuit wafer and package assemblies. One example of this is a silicon interposer, including silicon with multiple TSVs, but the invention can also be used to inspect integrated circuits...

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Abstract

In an embodiment, an automatic high-speed X-ray detection system generates a first X-ray image of a detected sample in a first direction that may be substantially orthogonal to a plane of the detected sample. The first X-ray image may be a high resolution grayscale image. The system may identify one or more elements of interest of the detected sample based on the first X-ray image. The first X-ray image may include interfering elements that interfere with one or more elements of interest in the first X-ray image. The system may determine one or more first features associated with the respective elements of interest based on changes in gray values in the first X-ray image. The system may determine whether one or more defects are associated with a respective element of interest based on one or more first features associated with the element of interest.

Description

technical field [0001] The present invention relates to high-speed inspection and inspection of objects using X-rays. Background technique [0002] Integrated circuits can be fabricated to include 3D or 2.5D structures. Since the optical photons or electrons used to inspect silicon wafers cannot penetrate ICs, interposers, or Cu-Cu dies for die bonding to provide an adequate view of the interior of packaged ICs, optical Inspection techniques that photonically or electronically inspect silicon wafers cannot be used to inspect 3D and 2.5D IC packages. Optical inspection methods also cannot inspect or metrology partially encapsulated components, a key requirement for process control. Since X-rays can penetrate multilayer packages, X-ray inspection can provide an internal view of assembled devices. [0003] However, existing X-ray systems lack sufficient resolution and imaging speed to meet the needs of high-resolution, high-throughput IC and electronic package inspection. F...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/04G01N23/083G01N23/18G06K9/62G06N20/00
CPCG01N23/04G01N23/083G01N23/18G06N20/00G06F18/214G01N2223/401G01N2223/505G01N2223/6466G01T1/20G06N20/20G06T7/001G06T2207/10016G06T2207/10116G06T2207/20081G06T2207/30141G06T2207/30148G06T2207/30152G06V10/82G06V2201/06G06N5/01G06N3/045G06F18/24G01N23/043G06T5/007G06F30/398H05K1/115H05K3/4038H01L21/67288G01N2223/04G01N2223/426G06T2207/10081G06T2207/20024G06T2207/20208G06T2207/30004G06F2115/12G06F2119/18G06T7/0012G06T7/0014
Inventor 大卫·刘易斯·阿德勒斯科特·约瑟夫·朱勒弗雷迪·埃里希·巴比安
Owner BRUKER NANO INC
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