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Preparation method of mesa-type infrared detector indium dot matrix, infrared detector, focal plane array chip and readout circuit chip

A technology of infrared detectors and focal plane arrays, applied in the field of infrared detectors, can solve the problems of poor reliability of thin films, poor certainty of UBM film components, and easy breakage, so as to achieve good conduction performance and save climbing Steps, unbreakable effect

Pending Publication Date: 2022-05-17
浙江拓感科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a mesa-type infrared detector indium point for the problems of the common electrode of the mesa-type infrared detector in the prior art that is easy to break during the climbing process, the composition of the UBM film is poor in certainty, and the film is thin and reliable. Fabrication method of array, infrared detector, focal plane array chip and readout circuit chip

Method used

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  • Preparation method of mesa-type infrared detector indium dot matrix, infrared detector, focal plane array chip and readout circuit chip
  • Preparation method of mesa-type infrared detector indium dot matrix, infrared detector, focal plane array chip and readout circuit chip
  • Preparation method of mesa-type infrared detector indium dot matrix, infrared detector, focal plane array chip and readout circuit chip

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Embodiment 1

[0044] Take the table height h 3 The diameter of the pixel electrode and the common electrode is 10um, and the thickness is 300nm. Both the pixel electrode and the common electrode use UBM metal electrodes, and the material is Cr / Au or Ti / Pt / Au or Ti / Au. The pixel electrode indium column 4 and the common electrode indium column are both rectangular columns, and the bottom surface size of the pixel electrode indium column is: 10umx10um, height h 1 It is 10um, and its volume is 1000 um. Calculate the height H of the pixel electrode indium ball 6 according to the formula (1) 1 About 10.4um. According to the height H of the pixel electrode indium sphere 1 Get the height H of the common electrode indium ball 2 The value is H 2 =10.4+3=13.4um, calculate the volume V of the common electrode according to formula (2) 2 = 1785um 3 .

[0045] Set the pixel electrode in the pixel electrode area, set the common electrode in the common electrode area, and then press the set height h...

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Abstract

The invention provides a mesa type infrared detector indium dot matrix preparation method, an infrared detector, a focal plane array chip and a readout circuit chip, and aims to overcome the defects that a common electrode of a mesa type infrared detector in the prior art is prone to breakage in the climbing process, and a UBM film layer is poor in component certainty, thin in film layer and poor in reliability. According to the manufacturing method, a chip substrate is provided with a table board with the height of h3, the top of the table board is a pixel electrode area, a common electrode area is arranged below the table board, a pixel electrode and a common electrode are manufactured in the pixel electrode area and the common electrode area respectively, and the table board type infrared detector comprises a focal plane array chip and a reading circuit chip. The electrodes on the focal plane array chip and the readout circuit chip are connected through the indium dot matrixes on the corresponding pixel electrode and the public electrode in a pressure welding mode, and by the adoption of the preparation method of the mesa-type infrared detector indium dot matrix, the infrared detector, the focal plane array chip and the readout circuit chip, the electrodes are not prone to being damaged and broken, and the production efficiency is improved. And the connection is more reliable.

Description

technical field [0001] The invention relates to the technical field of infrared detectors, in particular to a method for preparing an indium lattice of a mesa-type infrared detector, an infrared detector, a focal plane array chip and a readout circuit chip. Background technique [0002] Usually, the focal plane array chip and the readout circuit chip of the cooled infrared detector are electrically conducted and mechanically connected through a flip-chip interconnection process. The flip-chip interconnection process is to prepare indium lattices on the focal plane array chip and the readout circuit chip respectively, and connect the corresponding pixel electrodes of the two chips to the indium lattices on the common electrode by pressure welding, or only in the focal plane array chip. An indium lattice is arranged on the planar array chip or the readout circuit chip, and then the two are pressure-welded and interconnected through the indium lattice. For the table-type infra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0224H01L31/18G01J5/22G01J5/24G01J5/48
CPCH01L31/0224H01L31/18G01J5/22G01J5/24G01J2005/0077G01J2005/202Y02P70/50
Inventor 刘志方季小好
Owner 浙江拓感科技有限公司
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