Liquid medicine automatic proportioning and heating system for wafer cleaning

Abstract

The invention discloses an automatic liquid medicine proportioning and heating system for wafer cleaning, which comprises a shell, a stock solution barrel is mounted in the front of the interior of the shell, a proportioning barrel is mounted in the rear of the interior of the shell, the stock solution barrel is connected with the proportioning barrel through a pipeline, a pressure tank is mounted in the middle of the interior of the shell, and the proportioning barrel is connected with the pressure tank through a pipeline. A first liquid level sensor is installed in the pressure tank, an air inlet pipeline and an exhaust pipeline are sequentially installed on the top of the pressure tank, a heating barrel is further installed in the shell, an automatic water supplementing system is installed in the heating barrel, the heating barrel comprises a barrel body, a water heating pipe and a temperature monitoring sensor are installed in the barrel body, and a spiral pipeline is installed in the barrel body. According to the automatic liquid medicine proportioning and heating system for wafer cleaning, the liquid medicine flows in the heating barrel for a long time through the pipeline to be heated, the temperature required by the liquid medicine can be achieved by controlling the temperature of water in the heating barrel, the liquid is supplied through the pressure tank, it is guaranteed that liquid supply is stable, and a back suction function is achieved.

Description

technical field [0001] The invention relates to the technical field of wafer cleaning equipment, in particular to an automatic proportioning heating system for chemical liquid used for wafer cleaning. Background technique [0002] At present, the liquid proportioning systems on the market are not liquid supply systems for semiconductor cleaning machines. These liquid supply systems are either very rough and cannot achieve the proportioning accuracy and safety used in the semiconductor industry, or are very large and do not meet the dust-free requirements. The space and use environment of the workshop are required, and it is not convenient to clean the wafers. SUMMARY OF THE INVENTION [0003] The purpose of the present invention is to provide an automatic proportioning heating system for chemical solution used for wafer cleaning, so as to solve the above-mentioned problems in the background art. [0004] In order to achieve the above purpose, the present invention provide...

AI Technical Summary

Problems solved by technology

[0002] None of the chemical liquid proportioning systems currently on the market are aimed at the liquid supply system for semiconductor cleaning machines. These liquid supply systems are either very rough and cannot meet the proportioning accuracy and safety used in the semiconductor industry, or are too large to meet the requirements of dust-free The space and environment requirements of the workshop are not convenient for wafer cleaning

Images