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Wafer processing cleaning fluid, production method and equipment

A technology for producing equipment and cleaning solutions, applied in chemical instruments and methods, preparation of detergent mixture compositions, detergent compounding agents, etc.

Pending Publication Date: 2022-06-10
镌致实业重庆有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to provide a kind of wafer processing cleaning liquid, production method and equipment, aim at solving the traditional cleaning liquid production equipment to produce cleaning liquid, cleaning liquid is natural Cooling issues that reduce productivity

Method used

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  • Wafer processing cleaning fluid, production method and equipment
  • Wafer processing cleaning fluid, production method and equipment
  • Wafer processing cleaning fluid, production method and equipment

Examples

Experimental program
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Embodiment Construction

[0025] In this embodiment, the heat conduction column 18 and the heat dissipation plate 19 are uniformly made of copper-aluminum alloy, and have good heat conduction and heat dissipation performance. The heat conduction column 18 absorbs the heat of the mixed liquid and transfers it to the heat dissipation plate 19 Contact with the outside air to dissipate heat, the setting of the heat dissipation fins 20 increases the area of ​​the heat dissipation plate 19, improves the heat dissipation efficiency of the heat dissipation plate 19, and the first dustproof net 21 prevents the fan 14 from dissipating the heat from the air. The dust inhaled by the air outlet plate 16 into the box 11 is discharged through the cooling holes on the top of the box 11 itself, and the second dust-proof net 22 is set to prevent dust from entering through the cooling holes. The tank 11 affects the quality of the cleaning fluid.

[0026]Further, the preparation tank 1 includes a tank body 3, an agitator ...

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PUM

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Abstract

The invention relates to the technical field of cleaning fluid production, in particular to wafer processing cleaning fluid, a production method and equipment. Comprising a preparation tank and a cooling box, the cooling box comprises a box body, a heat exchanger and an air cooler, the air cooler comprises a draught fan, a cold air pipe, an air outlet plate and a one-way valve, cleaning liquid composition raw materials are sequentially guided into the preparation tank to be mixed and heated to prepare mixed liquid, and after the mixed liquid is guided into the box body, heat of the mixed liquid is absorbed through the heat exchanger and exchanges heat with outside air; meanwhile, the fan operates to blow air into the cold air pipe, the cold air pipe refrigerates the air and then guides the air into the air outlet plate, the air outlet plate blows out cold air to conduct air cooling heat dissipation on the mixed liquid, through double heat dissipation of the heat exchanger and the air cooler, the cooling time of the mixed liquid is greatly shortened, and therefore the production efficiency of the cleaning liquid is effectively improved; the problem that the production efficiency is reduced due to natural cooling of cleaning fluid produced by traditional cleaning fluid production equipment is solved.

Description

technical field [0001] The invention relates to the technical field of cleaning liquid production, in particular to a wafer processing cleaning liquid, a production method and equipment. Background technique [0002] Wafers generally refer to silicon wafers. During the production process, the grease lubricated by mechanical equipment, metal ions in emery or working fluid, and the oxide layer formed after the silicon wafer contacts with air can cause varying degrees of pollution to the silicon wafer. Cleaning with cleaning fluid is required. [0003] The production of cleaning liquid is a complicated process. After the cleaning liquid is prepared by traditional cleaning liquid production equipment, it is exported and stored after the cleaning liquid is cooled naturally. Contents of the invention [0004] The purpose of the present invention is to provide a wafer processing cleaning solution, production method and equipment, aiming to solve the problem that the cleaning sol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01F27/90B01F35/92C11D1/83C11D3/04C11D3/33C11D3/36C11D11/00B01F101/24
CPCC11D1/83C11D3/364C11D3/33C11D3/042C11D1/72C11D1/123C11D2111/22
Inventor 万小宁
Owner 镌致实业重庆有限公司