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Display panel, display device and manufacturing method of display panel

A technology for display panels and substrates, which is used in identification devices, semiconductor/solid-state device manufacturing, instruments, etc., can solve problems such as poor flattening effect of a flattening layer, improve structural uniformity, reduce step difference, and improve flatness degree of effect

Pending Publication Date: 2022-07-29
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Embodiments of the present application provide a display panel, a display device, and a method for manufacturing a display panel, which can solve the problem of poor planarization effect of the planarization layer in existing display panels

Method used

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  • Display panel, display device and manufacturing method of display panel
  • Display panel, display device and manufacturing method of display panel
  • Display panel, display device and manufacturing method of display panel

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Embodiment Construction

[0049] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application. In addition, it should be understood that the specific embodiments described herein are only used to illustrate and explain the present application, but not to limit the present application. In this application, unless otherwise stated, the directional words used such as "upper" and "lower" generally refer to the upper and lower sides of the device in actual use or working state, specifically the drawing direction in the accompanying drawings ; while "inside...

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Abstract

The embodiment of the invention discloses a display panel, a display device and a manufacturing method of the display panel. The display panel comprises a substrate, a thin film transistor layer, a passivation layer and a first planarization layer which are sequentially arranged, a plurality of concave areas are formed in the side, away from the substrate, of the passivation layer, and at least part of the first planarization layer is located in the concave areas. The maximum value of the height of the first planarization layer relative to the substrate is smaller than or equal to the maximum value of the height of the passivation layer relative to the substrate. The first planarization layer is arranged in the concave area of the passivation layer, and the maximum height of the first planarization layer is smaller than or equal to the maximum height of the passivation layer, so that the segment difference generated by the concave area on the passivation layer can be reduced, the flatness of the surface of the passivation layer can be improved, manufacturing of a subsequent film layer is facilitated, and the structural uniformity of the subsequent film layer is improved.

Description

technical field [0001] The present application relates to the field of display, and in particular, to a display panel, a display device and a manufacturing method of the display panel. Background technique [0002] With the development of display technology, inkjet printing technology is gradually favored by people. Among them, the ink flows after printing to the pixel area, and the flatness of the substrate in the pixel area is an important factor affecting whether the ink can spread evenly and well, that is, the pixel area The smaller the maximum break of the substrate, the better. In the production process of the display panel, when the array substrate is fabricated, a non-flat surface with different heights will be formed. At present, a planarization layer is often formed on the surface of the array substrate to planarize the surface of the array substrate, and by increasing the flatness The thickness of the layer is adjusted to improve the planarization effect. Howeve...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/12H01L21/84G09F9/33
CPCH01L27/1218H01L27/1296H01L27/1262G09F9/33
Inventor 不公告发明人
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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