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Wet-dusting and high-boiling-point separation technology for organic silane chloride synthesized gas

An organochlorosilane, wet dust removal technology, applied in the fields of silicon organic compounds, separation methods, organic chemistry, etc.

Inactive Publication Date: 2003-08-27
蓝星安迪苏股份有限公司
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Problems solved by technology

The patent only mentions the utilization method of the washing liquid after wet dedusting, but does not mention the wet dedusting process and equipment of organochlorosilane gas

Method used

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  • Wet-dusting and high-boiling-point separation technology for organic silane chloride synthesized gas

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Embodiment Construction

[0008] The high-temperature synthesis gas from the secondary cyclone separator enters the scrubber from the bottom of the scrubber, and the pressure at the top of the scrubber is controlled at 0.3 MPa. The reflux ratio of the scrubber and the temperature at the top of the scrubber are 60°C. After being washed by the scrubber, the temperature drops to 70°C. Liquid and solid impurities such as washing liquid and silicon powder overflow from the tower kettle to the tower kettle re-evaporator, and the re-evaporator is heated with heat transfer oil, and the gas phase temperature of the re-evaporator is controlled at 220°C. The liquid level of the re-evaporator is controlled by a two-position switch at the bottom, and the high-boiled methylchlorosilane with a solid content of 30% and dust is discharged into the flash tank, and the flashed gas enters the flash condenser for condensation without condensation. The gas is washed by the water washing tower and then emptied, and the conden...

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Abstract

The invention describes a dust-cleaning technique using wetting method of organic chlorosiline gas. The synthetical gas from double cyclone enters inside from the bottom of washing tower, the discharged liquid from the kettle enters in flash pot, evaporated gas enters in flash condenser, non-condensing gas is entirely discharged after washed by washing tower, condensed liquid enters in liquid-recovery tank and residue is discharged into residual tank. The gas on the top enters in precooling device on top of the tower, after gas-phase is deeply cooled, non-condensing gas goes to chlorine methane buffering pot, condensed liquid enters in rough monomer medium pot, part of which returns to the tower and part of discharging is sent to rough monomer tower for processing.

Description

technical field [0001] The organochlorosilane gas continuous wet dust removal and high boiling separation process disclosed by the invention has the characteristics of high dust removal efficiency, low labor intensity, small material loss and the like. Background technique [0002] In the past domestic and foreign patents and literature, there were few reports on the wet dust removal process and equipment of organochlorosilane gas. The Chinese patent provides a method for utilizing the washing liquid for wet dust removal in the synthesis of methylchlorosilane. The process is to esterify the washing liquid with a solid-to-liquid ratio of 0:1 to 1:3 with industrial ethanol, and the amount of ethanol is 1.0 to 1.3 times the chlorine content in the washing liquid, or to dissolve it in alkali with 40% aqueous sodium hydroxide solution to obtain Silicone waterproofing agent can be used for waterproofing treatment of buildings or building materials. This patent only mentions the u...

Claims

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Application Information

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IPC IPC(8): B01D3/06B01D47/06C07F7/12C07F7/20
Inventor 陈志法汤庆成葛有根郭守涛易有彬聂忠华宋小明程红斌罗斯格
Owner 蓝星安迪苏股份有限公司
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