Substrate processor and substrate processing method
A substrate processing device and substrate processing method technology, applied in the direction of chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc., can solve problems such as the inability to provide processing liquids for wafers
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0064] Hereinafter, a substrate cleaning unit, which is a substrate processing apparatus for cleaning a wafer as an example of a substrate, will be described. figure 1 It is a plan view of the cleaning processing system 1 in which the substrate cleaning units 12, 13, 14, and 15 of this embodiment are combined. figure 2 is its side view. This cleaning processing system 1 is composed of a cleaning processing unit 2 that performs cleaning processing on wafers W and heat treatment after the cleaning processing, and a loading and unloading unit 3 that loads and unloads wafers W from the cleaning processing unit 2 .
[0065] The loading and unloading section 3 is composed of an entrance and exit 4 provided with a mounting table 6 for mounting containers (containers C) capable of horizontally holding, for example, 25 wafers W at predetermined intervals, and has containers C mounted on the mounting table 6 and a washing machine. The wafer transfer unit 5 of the wafer transfer device...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com