Method for forming nano TiO2 light catalystic active agenbt coating on substrate

A technology of nano-titanium dioxide and activator, which is applied in metal material coating process, coating, device for coating liquid on the surface, etc., can solve the problems of difficult separation and recovery of photocatalysts, difficult to reuse, etc., and the method is simple and convenient. , The effect of the material coating is firm and the application prospect is broad.

Inactive Publication Date: 2004-04-28
INST OF CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the existing photocatalytic products whose photocatalytic efficiency has reached the practical level are powders, and most of the researches are carried out in the suspension system. In this way, there are problems of separation and recovery of photocatalysts during use, and it is not easy to reuse

Method used

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  • Method for forming nano TiO2 light catalystic active agenbt coating on substrate
  • Method for forming nano TiO2 light catalystic active agenbt coating on substrate
  • Method for forming nano TiO2 light catalystic active agenbt coating on substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Polish the metal aluminum plate first, then heat it to 500°C, keep the temperature for 3 hours, and use plasma spraying equipment to spray anatase phase nano-titanium dioxide powder on the polished side. Nitrogen used for spraying (N 2 ) and ordinary hydrogen (H 2 ) mixed gas, hydrogen accounts for 10% by volume of the mixed gas. The total gas flow of working gas is about 40m 3 / h, the pressure is 0.5MPa, with ordinary nitrogen (N 2 ) is powder gas. Its parameters are: spray distance 200mm, powder feeding flow rate 60g / min, power 27.5kW, control coating thickness at about 1.0μm. After spraying, keep the aluminum plate at a constant temperature of 300°C for 2 hours, and cool it down to room temperature naturally. Under the operating frequency of 20 Hz, the sprayed substrate is ultrasonically treated for 120 min, and the powder shedding rate is ≤5wt%.

Embodiment 2

[0031] Clean the glass sheet first, then heat it to 200°C, and after constant temperature for 2 hours, use plasma spraying equipment to spray anatase phase nano-titanium dioxide powder on its clean surface. Nitrogen used for spraying (N 2 ) and ordinary hydrogen (H 2 ) mixed gas, the proportion of hydrogen in the mixed gas volume is 15%. The total gas flow of working gas is about 40m 3 / h, the pressure is 0.7MPa, with ordinary nitrogen (N 2 ) is powder gas. Its parameters are: spray distance 150mm, powder feeding flow rate 50g / min, power 25.0kW, control coating thickness at about 0.8μm. After spraying, the glass sheet was kept at a temperature of 300°C for 3 hours, and then naturally cooled to room temperature. Under the operating frequency of 20 Hz, the sprayed substrate is ultrasonically treated for 120 min, and the powder shedding rate is ≤5wt%.

Embodiment 3

[0033] Clean the ceramic plate first, then heat it to 400°C, and after keeping the temperature constant for 2 hours, use plasma spraying equipment to spray rutile phase nano-titanium dioxide powder on the clean surface. Nitrogen used for spraying (N 2 ) and ordinary hydrogen (H 2 ) mixed gas, the proportion of hydrogen in the mixed gas volume is 20%. The total gas flow of working gas is about 40m 3 / h, the pressure is 0.6MPa, with ordinary nitrogen (N 2 ) is powder gas. Its parameters are: spray distance 200mm, powder feeding flow rate 30g / min, power 40.5kW, control coating thickness at about 1.0μm. After spraying, the ceramic plate was kept at a temperature of 400° C. for 2 hours, and then naturally cooled to room temperature. Under the operating frequency of 20 Hz, the sprayed substrate is ultrasonically treated for 120 min, and the powder shedding rate is ≤5wt%. Its scanning electron microscope image is attached image 3 For comparison with its photocatalytic activit...

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Abstract

The present invention belongs to the field of coating technology, and is especially plasma spray process of forming nano TiO2 photocatalytic activator coating on substrate. The process includes utilizing the mixed gas of nitrogen or argon and hydrogen as work gas and nitrogen as powder feeding gas; cleaning the substrate, preheating at 200-600 deg.c, spraying nano TiO2 powder onto the surface of the substrate in a plasma spraying equipment to form nano TiO2 film; and sintering at 500-600 deg.c to cure the nano TiO2 film completely and obtain the nano TiO2 photocatalytic activator coating. The coating is firm, stable and high in photocatalytic activity. The present invention may be used widely in the carrying of photocatalyst and heat spraying of nano powder.

Description

technical field [0001] The invention belongs to the field of coating, and in particular relates to a method for forming a nano-titanium dioxide photocatalytic active agent coating on a base material by using a plasma spraying technology. Background technique [0002] Due to the rapid advancement of science and technology, human production practices continue to expand, and the ensuing environmental pollution and destruction have also developed to a degree that threatens human existence. In recent years, the use of semiconductors as heterogeneous photocatalysis has been applied in the environmental field, especially in the treatment of organic pollutants in gas phase and water. Among the semiconductor materials that can be used for photocatalysis, titanium dioxide crystals have high photocatalytic activity, and it is also the most widely and deeply researched semiconductor metal oxide in photocatalytic applications. Under the irradiation of light, it c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05B5/025B05B5/03B05B5/06B05B7/14B05B7/22B05D1/00B05D7/14C23C4/11C23C4/134H05H1/32
Inventor 杨青林江雷
Owner INST OF CHEM CHINESE ACAD OF SCI
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