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4results about How to "Improve oxidation capacity" patented technology

Isolating horizontal conveying device between conductive tank and oxidation tank for coil anodizing

ActiveCN224299404Uavoid crosstalkpromote oxidationAnodisationElectrolysis componentsMechanical engineeringMaterials science
The utility model provides a horizontal conveying device between the conductive groove and oxidation groove for roll stock anodic oxidation, including groove body device, and groove body device includes conductive groove and oxidation groove, be provided with first passageway in one side of conductive groove, be provided with second passageway in one side of oxidation groove, be provided with first water press roller mechanism outside first passageway, and first water press roller mechanism includes first water press roller group, and first water press roller group includes two first water press rollers, and there is first conveying passageway between two first water press rollers, be provided with second water press roller mechanism outside second passageway, and second water press roller mechanism includes second water press roller group, and second water press roller group includes two second water press rollers, and there is second conveying passageway between two second water press rollers, and first conveying passageway and second conveying passageway horizontal setting, utilize the structure of the utility model, when the roll stock being unwound is horizontally conveyed through conductive groove and oxidation groove, can effectively avoid the liquid mutual stringing between conductive groove and oxidation groove, improves oxidation effect.
Owner:GUANGDONG KEJIE CIRCUIT BOARD EQUIP CO LTD

Etching solution, etching method of gan material, and method for manufacturing gallium nitride transistor

PendingCN122256001AImprove oxidation capacityachieve targeted removalSurface treatment compositionsTetramethylammonium hydroxideEtching
The present disclosure provides an etching solution, a GaN material etching method and a gallium nitride transistor manufacturing method, and belongs to the technical field of semiconductors. The etching solution comprises a tetramethylammonium hydroxide solution and an oxidizing agent, the concentration of the tetramethylammonium hydroxide solution is 0.1-2.0 mol / L, and the concentration of the oxidizing agent is 0.01-0.5 mol / L. The present disclosure can improve the etching effect of GaN materials.
Owner:BOE HUACAN OPTOELECTRONICS (GUANGDONG) CO LTD

A method for synergistic treatment of hexavalent chromium and sulfadimethylpyrimidine complex wastewater

This invention discloses a method for the synergistic treatment of hexavalent chromium and sulfadiazine complex wastewater. The method utilizes a bimetallic node coupled with a metal-organic framework derivative electrode for the synergistic treatment of hexavalent chromium and sulfadiazine complex wastewater. The electrode includes a conductive substrate coupled with ZrO2 and ZnO. In this invention, the bimetallic node coupled with a metal-organic framework derivative electrode is used as the working electrode. The resulting photoelectrocatalytic system has advantages such as strong light utilization, fast electron transfer efficiency, and strong conversion effect between complex free radical chemistry and different active substances. It can not only achieve the synergistic degradation of hexavalent chromium and sulfadiazine in wastewater, but also simultaneously and efficiently remove both hexavalent chromium and sulfadiazine from the wastewater. It has advantages such as good recyclability, high removal efficiency, good cycle performance, and strong practical application, making it a widely applicable photoelectrocatalytic method with high practical value and application prospects.
Owner:HUNAN UNIV

Hazardous waste chemical sewage zero discharge graded purification treatment equipment

ActiveCN119638113BHigh efficiency filtration capacityFast and effective filtering capabilityFractional PrecipitationSewage
The application discloses a kind of hazardous waste chemical industrial wastewater zero discharge graded purification treatment equipment, including sequentially connected pretreatment mechanism, catalytic treatment mechanism, hierarchical precipitation separation mechanism, biological treatment mechanism and membrane separation mechanism;Pretreatment mechanism includes grid intercepting mechanism, grid intercepting mechanism includes grid intercepting containing shell, vertically extending grid support ring shell is fixed in grid intercepting containing shell, a plurality of inner and outer communication and vertically extending grid mounting slot are formed on the side wall of grid support ring shell, and filter grid is installed in grid mounting slot;The equipment can quickly and effectively remove solid particles, colloid and other suspended solids in hazardous waste chemical industrial wastewater, and the grid discharging mechanism can clean the filter grid in time, maintain the effective filtering capacity of the filter grid;Catalytic treatment mechanism can occur a series of oxidation reactions with organic pollutants in wastewater, and gradually decompose organic pollutants into carbon dioxide, water and other harmless inorganic substances.
Owner:ZHONGJIU HUANENG TECHNOLOGY CO LTD