Susceptibility gene closely related to schizophrenia

A schizophrenia and susceptibility gene technology, applied in genetic engineering, plant genetic improvement, and the determination/inspection of microorganisms, can solve the problem of not finding schizophrenia susceptibility genes, and achieve considerable social and economic benefits.

Inactive Publication Date: 2005-06-22
JILIN UNIV
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But so far no specific susceptibility genes related to schizophrenia have been found in this chromosome region

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Susceptibility gene closely related to schizophrenia
  • Susceptibility gene closely related to schizophrenia
  • Susceptibility gene closely related to schizophrenia

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0057] The genotype analysis of single nucleotide polymorphism rs3782929 was carried out by extracting the subjects' genomic DNA, and the individuals whose rs3782929 base was G were the susceptible population of schizophrenia.

[0058] 1. Genomic DNA Extraction

[0059] 5ml of anticoagulated blood was drawn from the peripheral vein of the subjects, and genomic DNA was extracted with Singpu Liquid Micro DNA Extraction Kit (Ningbo). The steps are as follows: ①Take 100 μl of blood sample, add it to a 1.5ml centrifuge tube, then add 100 μl of 1×TE buffer, and shake well; ②While shaking, add 200 μl of B1 reagent and mix well; ③Add 200 μl of ④ Move the mixed solution into the spinning spin column and centrifuge (14000rpm, minute); ⑤ Add 400μl of B3 reagent to the spinning spin column and centrifuge (14000rpm, 1 minute); ⑥Repeat the above steps; ⑦ Centrifuge the empty column (14000rpm, 2 minutes), transfer the spinning spin column into a clean 1.5ml centrifuge tube, add 100μl of B4 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a susceptibility gene closely related to schizophrenia, i.e. Karyopherin alpha 3 (KPNA3) gene containing two mononucleotide polymorphism sequence length of 93596bp, because accident mutation occurs on the mononucleotide polymorphism rs3782929 base C of the gene into G, it is related to the susceptibility of schizophrenia. The individuals whose rs3782929 base is G are susceptible population of schizophrenia, while the individuals whose rs3782929 base is an are not susceptible to schizophrenia.

Description

technical field [0001] The present invention relates to a susceptibility gene KPNA3 significantly associated with schizophrenia. Background technique [0002] Schizophrenia is one of the most serious mental illnesses. In my country, the lifetime prevalence rate of schizophrenia is as high as 0.7%. Such a large group of patients not only brings a heavy economic burden to families and society, but also seriously threatens social security and stability. Therefore, to determine the etiology of schizophrenia and to establish effective prevention methods has become an urgent problem to be solved in the medical field and even the whole society. Schizophrenia is closely related to genetic factors and is classified as a polygenic genetic disease. A systematic scan of the human genome found that, except chromosomes 19, 21 and Y, all other chromosomes may contain schizophrenia susceptibility genes. Locating the susceptibility genes of schizophrenia using linkage and association met...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C12N15/12C12Q1/68
Inventor 尉军于雅琴张海英鞠桂芝刘树铮沈岩张萱史杰萍谢林许琪胡颖
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap