Method for manufacturing optical waveguide device and optical waveguide device
A manufacturing method and technology of optical waveguide, applied in the direction of optical waveguide light guide, light guide, optical element, etc., can solve the problems such as adverse effects of optical waveguide transmission efficiency
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Embodiment approach 1
[0036] Below, use image 3 (1) to (9) The method of manufacturing the optical waveguide device of the present invention provided with the above means (1) will be described in more detail.
[0037] First, on the whole silicon substrate 1 ( image 3 (1)), utilize the spin coating machine that has the structure shown in Figure 1 to coat the 1st polyimide precursor solution, to form material solution film, it is heat-dried, solvent is evaporated, then, under high temperature The resin is cured by heating to form the lower cladding layer 3 composed of the first polyimide resin film ( image 3 (2)).
[0038] On the lower cladding layer 3, the second polyimide precursor solution is coated with a spin coater to form a material solution film, which is heated and dried to evaporate the solvent, and then heated at a high temperature to cure the resin. To form the second polyimide resin film 4 ( image 3 (3)).
[0039] A resist is applied on the second polyimide resin film 4 with a spin ...
Embodiment approach 2
[0057] The present invention is characterized in that, in the third step of coating the material solution of the second resin film on the surface of the lower cladding layer 3 and the core layer 4 by the spin coating method and forming the second resin film after drying, the The means of the evaporation rate of the solvent of the material solution of the second resin film is to prevent bubbles from being generated in the branch part. Wetting method to reduce air bubbles.
[0058] Next, this method will be described.
[0059] Depend on image 3 In the steps (1) to (6), the core layer 4 is formed on the substrate 1 in the same manner. Next, prior to the step of forming the upper cladding layer 5 , the upper cladding layer 3 and the side surfaces and upper surfaces of the core layer 4 are treated to improve the wettability of the material solution for the upper cladding layer 5 . This treatment is a treatment of coating the upper cladding layer 3 with the solvent used for the m...
Embodiment 1～6 and comparative example 1～4
[0066] According to the first embodiment, an optical waveguide device is manufactured using a silicon substrate having a diameter of 125 mm. As a spin coater, the first polyamide coated on the surface of the lower cladding layer 3 and the core layer 4 was coated with the coater shown in FIG. 1 (closed rotary cup) and FIG. 2(B) (open type). The amount of the imine precursor solution was changed to produce upper cladding layers 5 of various thicknesses, which were removed so that the thickness of the core layer 4 from the upper surface of the lower cladding layer 3 was less than three times, and as the upper cladding layer 5, also A protective layer 9 is provided. The components of each layer used and the drying and curing treatment conditions are as follows.
[0067]Lower cladding layer 3 and upper cladding layer 5: a polyimide film (heated at 100° C. for 30 minutes, Next, heat at 200°C for 30 minutes to evaporate the solvent, and heat at 370°C (350°C for upper cladding layer...
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