Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Level gauge

A level and plane technology, applied in the field of level, can solve the problems of large volume and high cost, and achieve the effects of small volume, reduced components and simple structure

Inactive Publication Date: 2005-08-24
ASIA OPTICAL CO INC
View PDF0 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the defects of high cost and large volume of the existing technology using rotating point-shaped light spots, the present invention provides a circle-marking level with low cost, simple structure and small volume

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Level gauge
  • Level gauge
  • Level gauge

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] Such as figure 1 As shown, the spirit level 100 of the present invention includes a semiconductor laser device 10 , an aspheric cylindrical mirror 20 , an aspheric mirror 30 and a conical reflector 40 .

[0012] The aspherical lenticular mirror 20 is substantially columnar and made of glass or other light-transmitting materials. The light incident surface 21 and the first light exit surface 22 are convex aspheric surfaces. The aspheric lenticular mirror 20 can diffuse and converge a light beam in a specific direction to generate a circular cross-sectional light beam.

[0013] The aspheric mirror 30 also has two optical end surfaces, ie, a second light incident surface 31 and a second light exit surface 32 , and the two end surfaces are convex aspheric surfaces. The aperture ratio of the aspheric mirror 30 is larger than that of the aspheric lenticular mirror 20 .

[0014] The conical reflector 40 is conical, the conical surface 41 has good reflection ability, can be c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

This invention relates to a kind of spirit level, this spirit level includes light source and cone reflector, this cone reflector's surface is reflect surface, use for reflecting the light beam from light source, make light beam present circumference radiation light beam level after reflecting, among them, light source this close to cone reflector set up summit pinnacle, and put it on the axis of this cone reflector centre.

Description

【Technical field】 [0001] The invention relates to a level, in particular to a level capable of marking a circle. 【Background technique】 [0002] At present, in the process of construction, especially in the process of interior and exterior wall decoration, it is difficult to determine the same horizontal plane on different walls. Only the method of measuring with a ruler is used to roughly draw a horizontal line on the wall. This method is not only slow, but also And imprecise, so that the construction quality cannot be guaranteed, or use the liquid equal pressure relationship in the slender water pipe to get the same level mark of the same height on different walls, but this method is difficult to apply to large-scale work bases, for this reason A spirit level was invented to mark a horizontal reference line. [0003] In the prior art, there are two main methods for marking the horizontal reference line in the spirit level: the direct emission type and the optical rotation...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01C5/02G01C15/00
Inventor 陈建任方志宏
Owner ASIA OPTICAL CO INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products