Holographic convex surface grid photo-etching light path design method

A technology of convex grating and design method, applied in optics, optical components, instruments, etc., to achieve the effect of light weight, simple structure and small spectral aberration

Inactive Publication Date: 2005-09-07
UNIV OF SHANGHAI FOR SCI & TECH
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Problems solved by technology

[0003] The purpose of the present invention is to overcome the shortcomings of the existing holographic convex grating photoetching optical path, to provide a concentric three-mirror optical system with an optical path of "no" aberration ring field of view to lithographic convex grating, and to manufacture a convex grating that is better than the conventional method. Optical Path Design Method for Holographic Convex Grating Lithography with Higher Image Quality

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  • Holographic convex surface grid photo-etching light path design method
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  • Holographic convex surface grid photo-etching light path design method

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[0018] A holographic convex grating photolithography optical path design method is characterized in that it comprises the following steps, comprising: figure 2 Shown: establish a kind of concentric three-mirror optical system " no " aberration ring field photolithography optical path, it is made up of laser 9, beam splitter 10, mirror 11, 12, objective lens 13, 14, spatial filter 15, 16 , concave mirror 18, the convex grating substrate 17 is placed on the position of the convex mirror of the concentric three-mirror optical system, the laser beam emitted by the laser 9 is split into two beams by the beam splitter 10, which are divided by two mirrors 11, 12 reflects two beams parallel to each other, then injects into two objective lenses 13, 14 respectively, focuses on spatial filters 15, 16, and enters a concentric three-mirror system composed of concave mirror 18 and convex grating 17, two spatial filters Devices 15 and 16 are on the field of view of the "no" aberration ring ...

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Abstract

The invention discloses a design method of holographic convex grating light path. Characteristics: it is a light path photoetching on a ''no'' optical aberration ring-shaped visual field of the concentric three reflector optical system, confirming the structural parameter of the big concave mirror by graphical method according to the parameter of the convex grating photoetched, and figuring out the place of ''no'' optical aberration ring-shaped visual field. The advantage of the photoetching light path designed in the method is: theoretical optical aberration on the ring approaches zero, the optical aberration produced by the changes of aperture angle is minimal; aberration is zero, so it can produce top-quality convex gratings, and the spectrum optical aberration is small.

Description

technical field [0001] The invention relates to a method for designing a holographic convex grating photoetching optical path. The photoetching optical path is invented by using the imaging characteristics of a concentric three-mirror optical system, and belongs to the field of grating photoetching optical paths. technical background [0002] Convex gratings are generally rarely used due to their imaging characteristics, and there are no literature or patent publications that specifically introduce the manufacture of convex gratings. In some special concentric optical systems, convex gratings have very good characteristics, such as imaging spectrometers with OFFNER structures. Convex gratings are easier to make into blazed gratings and have higher diffraction efficiency than concave gratings. Grating manufacturing methods generally include mechanical scribing, photoelectric scribing, holographic scribing and grating replication. Compared with mechanical scribing, holograph...

Claims

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Application Information

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IPC IPC(8): G02B17/00G02B27/00
Inventor 黄元申庄松林倪争技
Owner UNIV OF SHANGHAI FOR SCI & TECH
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