Unit structure for realizing multi-bit memory
A cell structure and multi-bit storage technology, which is applied in the field of devices in the field of microelectronics technology, can solve problems such as difficult to achieve and data repeatability problems, and achieve the effects of ensuring repeatability, improving storage density, and good stability
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Embodiment 1
[0018] Such as figure 1 As shown, the present invention includes: substrate 1, lower electrode 2, phase change layers 3, 4, 5, heating layers 6, 7, 8, barrier layers 9, 10, 11, 12, upper electrode 13, insulating sidewall 14, Substrate 1 is arranged on the lowermost layer, lower electrode 2 is arranged on the top of substrate 1, upper electrode 13 is arranged on the uppermost layer, phase change layers 3, 4, 5 are arranged between lower electrode 2 and upper electrode 13, barrier layer 9 is arranged Between the lower electrode 2 and the phase change layer 3, the barrier layer 12 is disposed between the phase change layer 5 and the upper electrode 13, the barrier layer 10 is disposed between the phase change layer 3 and the phase change layer 4, and the barrier layer 11 is disposed between the phase change layer 3 and the phase change layer 4. Between the phase change layer 4 and the phase change layer 5, the heating layers 6, 7, 8 are respectively arranged in the middle of the ...
Embodiment 2
[0025] Such as figure 2 As shown, the present invention includes: a base 1, a lower electrode 2, different phase change layers 3, 4, 5 of phase change materials, a heating layer 6, an upper electrode 13, and an insulating side wall 14, the base 1 is arranged at the bottom layer, and the base 1 is provided with the lower electrode 2, the upper electrode 13 is arranged on the uppermost layer, the phase change layers 3, 4, 5 are arranged between the lower electrode 2 and the upper electrode 13, the heating layer 6 is arranged in the middle of the phase change layer 4, and the lower electrode 13 is arranged on the uppermost layer. The electrode 2 , the phase change layers 3 , 4 , 5 , the heating layer 6 , and the upper electrode 13 are all arranged in the pores of the insulating side wall 14 .
[0026] The materials of the phase change layers 3, 4, 5 are chalcogenide compounds and dopants of chalcogenide compounds and N, O, Si or Sn. The transition of chalcogenides between amorp...
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Abstract
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