Etching liquid, bulking liquid and forming method of conductive image using same
A conductor pattern and etching solution technology, applied in the field of conductor pattern formation, can solve the problems of slow etching speed, copper layer dissolution, wiring resistance increase, etc.
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[0047] Next, examples of the etching solution of the present invention will be described in conjunction with comparative examples. However, the present invention is not limited to the following examples.
[0048] (Preparation of etching solution)
[0049] The components shown in Table 1 were mixed to prepare etching solutions of Examples 1-8. In addition, the components shown in Table 2 were mixed to prepare etching solutions of Comparative Examples 1-3. In addition, the etching solutions of Examples 5 and 8 were prepared by mixing components other than nitrogen oxide (NO), and blowing 3 liters of NO gas with respect to 1 kg of the mixed solution.
[0050] (Etching of Ni-Cr alloy)
[0051] A material to be processed in which a Ni-Cr alloy film was formed on a polyimide film by sputtering was prepared. In the material to be processed, the thicknesses of the polyimide film and the Ni-Cr alloy film were 50 μm and 0.1 μm, respectively, and the atomic ratio (Ni / Cr) of Ni and Cr...
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