Heating apparatus, coating and development apparatus, and heating method
一种加热装置、加热方法的技术,应用在照明和加热设备、加热来干燥固体材料、炉子组件等方向,能够解决晶片弯曲程度大、位置偏移等问题,达到降低附着、防止位置偏移的效果
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[0034] Hereinafter, as an example of an embodiment of the heating device according to the present invention, for example, a semiconductor wafer (hereinafter simply referred to as a wafer) W, on which a resist solution is applied as a coating solution on the surface, is subjected to heat treatment. The heating device 2 for forming a resist film on the surface of the wafer W will be described with reference to FIGS. 1 to 3 . In addition, as the size of the wafer W, for example, a size of 12 inches or more is used. This heating device 2 has a box body 20, and a transport port 21 for wafers W is opened on a side wall of the box body 20, and the transport port 21 is freely openable and closable by a shutter 21a. The shutter 21a is provided to prevent the airflow formed around the wafer W described later from being disturbed by outside air flowing into the housing 20 through the transfer port 21 when the wafer W is heated. 21, for example, an air curtain is provided in place of the...
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