Display device and method for producing same

A technology for display devices and manufacturing methods, applied in static indicators, optics, instruments, etc., can solve problems such as ACF applied pressure connection, achieve effective connection, suppress formation, and reduce contact resistance

Active Publication Date: 2006-11-01
JAPAN DISPLAY INC
View PDF1 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Here, in the above-mentioned terminal part, since the planarizing film is relatively soft, there is a problem that it is not possible to sufficiently connect the ACF with pressure.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Display device and method for producing same
  • Display device and method for producing same
  • Display device and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] Embodiments of the present invention will be described below with reference to the accompanying drawings.

[0045] FIGS. 1(A) and 1(B) are structural diagrams showing the COG terminal portion according to this embodiment.

[0046] The data line DL is formed on the interlayer insulating film 60, extends to the peripheral portion, and is terminated right in front of the COG terminal portion. A contact hole is formed in the interlayer insulating film 60 at the end portion of the data line DL, and is connected to the molybdenum wiring 80 below. Furthermore, the molybdenum wiring 80 extends from the COG terminal portion, and the connecting wiring 10 is formed on the molybdenum wiring 80 . In addition, the molybdenum wiring 80 and the gate electrode (gate line) mentioned later are produced in the same process.

[0047] The protective film 12 is formed on the connection wiring 10 , the data line DL, and the interlayer insulating film 60 located between the connection wiring ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A portion of a protective layer located above a connection portion is removed to expose the connection portion which is formed of the same material as used for a data line DL in this removed portion. Then, a transparent conductive layer made of ITO is further formed on these films. The transparent conductive layer and a bump are then connected via an AFC.

Description

technical field [0001] The present invention relates to an active matrix display device having a COG (Chip on Glass) terminal portion for directly connecting other semiconductor integrated circuits to a peripheral portion, and a manufacturing method thereof. Background technique [0002] Conventionally, in display devices such as liquid crystal panels, active-matrix display devices in which display control thin-film transistors are arranged in each pixel have been widely used. [0003] In such a display device, a data signal (image signal) or the like from the outside is received into the panel, and the signal is supplied to each pixel. Therefore, vertical data lines and horizontal selection (gate) lines are provided, data signals are supplied to the data lines, and corresponding gate lines are used to select the pixels, and the supply of data signals to each pixel is controlled. Therefore, it is necessary to control the data supply to the data lines and the selection of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/133G02F1/1333G02F1/136G09G3/36H01L27/00
CPCG02F1/1345G02F1/13452G02F1/136
Inventor 小田信彦
Owner JAPAN DISPLAY INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap