Process for preparation of ultrapure hydrogen peroxide

A technology of ultra-pure hydrogen peroxide and hydrogen peroxide, applied in chemical instruments and methods, peroxide/peroxyhydrate/peroxyacid/superoxide/ozonide, inorganic chemistry, etc., can solve high-purity Hydrogen peroxide product index is low, the quality can not meet the use requirements and other problems, to achieve the effect of stable quality and good safety

Active Publication Date: 2007-02-28
SHANGAI HUAYI MICROELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The technical problem that the present invention solves is to provide a kind of preparation method of ultra-pure hydrogen peroxide, to overcome the deficiency that the high-purity hydrogen peroxide product index in the prior art is lower than SEMIC12 standard, and quality can not meet the use requirement

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] 1) Under the conditions of temperature 1-4°C and pressure 0.10MPa, the 35% industrial hydrogen peroxide feed liquid with a feed liquid temperature of 2-3°C is pretreated to reach the reagent grade, and the superficial velocity is 3.8 m / h Analyze the organic carbon content by macroporous adsorption resin (Piaolai Te Company: MNm-220]);

[0025] 2) Under the conditions of temperature 1-4°C and pressure 0.10MPa, the feed liquid obtained in step 1 at a temperature of 2-3°C is fed into a cation exchange resin column (SGC- 650, column height 1 meter) after leaving the cation resin exchange column, enter the anion exchange resin column (Piaolaite SGA-550, column height 1 meter), obtain a section of ion-exchanged feed liquid and enter the cation resin exchange column successively, and the anion exchange resin Column, mixed anion and cation exchange resin column (the volume ratio of anion and cation in the mixed anion and cation exchange column is 1:1, and the height of the colu...

Embodiment 2

[0029] Under the conditions of temperature 1-5°C and pressure 0.10-0.14MPa, the pretreatment quality of 35% industrial hydrogen peroxide feed liquid with a feed liquid temperature of 2-3°C reaches reagent grade, and passes through it at a superficial velocity of 6.4 m / h Macroporous adsorption resin, removes organic carbon, is identical with embodiment 1 method, obtains ultrapure hydrogen peroxide product, wherein the volume ratio of anion and cation in the mixed anion and cation exchange column is 1: 1.2, and column height is 1 meter, and test analysis result: The main content of hydrogen peroxide is 31.09%, the content of organic carbon is 8.736ppm, the content of single cation is less than 0.1ppb, the content of single anion is less than 30ppb, and the dust particles larger than 0.5μm are 8 / ml (see Table 1).

[0030] Analysis Project

SEMI C8

SEMI C12

Example 1

Example 2

Analytical Instruments

Content (H 2 o 2 )

30.0-32.0％

...

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PUM

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Abstract

The invention discloses a making method of ultrapure hydrogen peroxide, which comprises the following steps: adopting industrial hydrogen peroxide as raw material; predisposing through ionic exchanging method or distilling method to reach agent grade standard; adopting large-hole adsorbing resin to remove organic carbon; removing impurity ion through two-segment of ionic exchanging column; gathering the dust particle from film filter to obtain the object.

Description

technical field [0001] The invention relates to a method for preparing ultrapure hydrogen peroxide, more specifically a method for preparing ultrapure hydrogen peroxide that is used in semiconductors and ultra-large-scale integrated circuits and conforms to the SEMI C12 standard. Background technique [0002] As an important microelectronic chemical, ultra-clean and high-purity hydrogen peroxide is widely used in cleaning and corrosion in the assembly and processing of semiconductors and VLSIs. With the rapid development of the electronics industry, hydrogen peroxide Purity requirements are getting higher and higher, from high-purity hydrogen peroxide (a single cation content is at the ppm level) to ultra-pure hydrogen peroxide (single cation content is at the ppb level), and all indicators are required to meet the requirements of the International Semiconductor Equipment and Materials Organization Formulated chemical materials part 12-SEMI C12 standard (hereinafter referred...

Claims

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Application Information

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IPC IPC(8): C01B15/013
Inventor 沈丽萍汤慧吴家白惠绍樑顾松美
Owner SHANGAI HUAYI MICROELECTRONICS MATERIAL
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