Cumulate molecular beam source for organic thin film

An organic thin film, molecular beam technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve problems such as substrate pollution

Inactive Publication Date: 2007-02-28
CHOSHU IND
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In addition, as another defect of the evaporation means related to the film-forming material, a bad result is also pointed out; that is, since the organic film-forming material can generate vapor under the environment of high evaporation pressure and low temperature, as long as the material is put into the crucible and Placing it in a vacuum can unintentionally or unexpectedly generate vapors of the film-forming material, thereby contaminating the substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cumulate molecular beam source for organic thin film
  • Cumulate molecular beam source for organic thin film
  • Cumulate molecular beam source for organic thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] According to the invention, a valve is arranged on the route of the vapour, thereby making it possible to shut off the released vapour. Also, the heater is provided at the side of the molecule release opening where vapor is easy to condense or solidify; thereby preventing separation or deposition of evaporated material near the molecule release opening.

[0027] Hereinafter, embodiments according to the present invention will be fully explained with reference to the accompanying drawings.

[0028] FIG. 1 shows a molecular beam source emission region 1 of a material "a" formed by sublimation or evaporation of an emission film.

[0029] The heating material accommodating part 3 of the molecular beam source emitting area 1 has a cylindrical vapor generating source 31 made of metal such as SUS or the like, that is, a material having high thermal conductivity, and the heating material "a" to be heated is accommodated in the crucible 31 . As shown in FIG. 6, this heating ma...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates the molecular beam source used to cumulate organic film, which can form homogeneous film on the surface of large scale basement film without producing deposition or segregation at the opening of film forming material. The valve 33 is installed in the space from molecule heating part 12 to molecule deactivation opening 14, and the heater 18 and 19 are installed on the side of the molecule deactivation opening 14. On the side of the molecule deactivation opening 14 there is outer guiding element 13, and in the outer guiding element 13 there is inner guiding element 16. Between the outer guiding element and inner guiding element there is molecule deactivation channel 17, whose diameter increases along the deactivation direction. The heater 18 and 19 are installed on outer guiding element 13 and inner guiding element 16, and the heater 20 is installed on molecule deactivation opening 14.

Description

technical field [0001] The present invention relates to a molecular beam source for accumulation of organic thin films for heating a material to be formed in thin film form on the surface of a solid object or substance such as a substrate, etc., thereby melting and evaporating the thin film forming material; i.e. Generating evaporated molecules to grow thin films on the surface of solid objects, more particularly, it relates to a molecular beam source for the deposition of thin films of organic materials suitable for use in the deposition of thin films of organic materials on substrates such as A thin film of a solid object such as a solid object forms a surface. Background technique [0002] In recent years, attention has been paid to organic thin film devices, for example, organic electroluminescence (ie, EL) and / or organic semiconductors as typical or representative members thereof. For such thin film elements, the organic material is heated in a vacuum to spray vapor on...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/12C23C14/24
Inventor 小林理斋藤建勇
Owner CHOSHU IND
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products