Capacitive detecting structure and method for micro cantilever beam fatigue property

A fatigue characteristic and capacitance detection technology, applied in the field of micro-electronic mechanical system manufacturing for performance and reliability testing, can solve problems such as failure to reflect the decay process of micro-structure performance parameters, and achieve the effect of good reliability and high precision

Inactive Publication Date: 2007-04-11
SOUTHEAST UNIV
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Problems solved by technology

Such a method has great limitations for testing the fatigue reliability of the MEMS microbeam structure. It can only give the fatigue life of the microbeam, but cannot reflect the decay process of the microstructure performance parameters caused by fatigue.

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  • Capacitive detecting structure and method for micro cantilever beam fatigue property

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Embodiment Construction

[0011] specific implementation plan

[0012] The present invention adopts the scheme shown in accompanying drawing to realize. The test structure is mainly composed of the following parts: the structure is to arrange a layer of nitride layer 12 on the silicon substrate 11, and a group of test structures are suspended above the nitride layer 12. The center of the test structure is a film 9, The first cantilever beam 1, the second cantilever beam 2, the third cantilever beam 3, and the fourth cantilever beam 4 are respectively connected to the four corners of the membrane 9, and the outer ends of the four beams are respectively fixed on the nitriding Above the layer 12, a set of lower electrodes corresponding to the test structure is provided on the upper surface of the nitride layer 12, namely the first lower electrode 5, the second lower electrode 6, the third lower electrode 7, the fourth lower electrode 8, The fifth lower electrode The lower electrode 10, the first welding ...

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Abstract

The present invention is capacitive detecting structure and method for micro cantilever beam fatigue property. The structure includes one silicon substrate with one nitride layer, one test structure set over the nitride layer, and one corresponding lower electrode set on the upper surface of the nitride layer. One alternative pressure difference is applied between the test structure and the lower electrode set for the cantilever beam to vibrate reciprocally. In different vibration stages, the cantilever beam will change in rigidity to result in downward displacement change, and the capacitance between the test structure and the lower electrode set is detected to reflect the fatigue process of cantilever beam until the life end. The structure and the method are simple, intuitive, reliable and precise.

Description

technical field [0001] The present invention is a test structure and method based on capacitance detection fatigue "creep" manufactured by MEMS (micro-mechanical system) processing technology, which belongs to the field of micro-electro-mechanical system manufacturing, performance and reliability testing [0002] technology field. Background technique [0003] Reliability is an indispensable link in the process of industrialization. The current research on microelectronics has entered a stage of intensification, and many aspects of reliability have been well studied. However, the fatigue reliability analysis of microstructures in MEMS devices basically adopts fatigue research methods similar to metal materials. Mainly use the method of observing cracks to study fatigue, and obtain the S-N curve. Such a method has great limitations for testing the fatigue reliability of the MEMS microbeam structure. It can only give the fatigue life of the microbeam, but cannot reflect the ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N3/00G01M19/00G01B7/02G01M99/00
Inventor 唐洁影余存江黄庆安
Owner SOUTHEAST UNIV
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