Exposure equipment

Abstract

Exposure equipment (1) is provided with an exposure optical system (2) for irradiating a color filter board (6) with exposure light from a light source (7), and a transfer means (4), on which the color filter board (6) arranged to face the exposure optical system (2) is placed to be transferred at a fixed speed. The exposure equipment exposes an image on an opening part (10a) of a mask (10) arranged on an optical path of the exposure optical system (2). The exposure equipment is provided with an image pickup means (3), which performs image pickup of a black matrix (11) previously formed on the color filter board (6), having the front side of an exposure position of the exposure optical system (2) in a shifting direction of the transfer means (4) as an image pickup apposition. The equipment is also provided with a control means (5), which detects a previously set reference position in the black matrix (11) of which image has been picked up by the image picked up means (3), controls irradiation timing of the exposure light of the exposure optical system (2) with the reference position as the standard, and exposes the image of the opening part (10a) of the mask (10) at a prescribed position on the color filter board (6). Thus, the exposure equipment which performs efficient exposure to a large exposure area by using the small mask is provided.

Description

technical field

[0001] The present invention relates to an exposure apparatus for exposing an image of an opening of a light-shielding plate interposed in a path of the exposure optical system on an object to be exposed by irradiating exposure light with an exposure optical system, and more specifically relates to an exposure apparatus as follows : By moving the object to be exposed at a certain speed, and at the same time taking the preset reference position of the reference pattern formed on the object to be exposed as a reference, the setting of the exposure position and the irradiation time of the exposure light are controlled. to efficiently expose over a wide exposure area. Background technique

[0002] Existing exposure devices of this kind include: a stage, which holds the substrate with the photosensitive material facing upwards and can control the movement of the substrate in the X, Y, Z axial and θ directions, and can at least move the substrate in the X, Y Stepp...

Images