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Direct writeTM system

a writetm system and material technology, applied in the direction of resistive material coating, printing, solid-state devices, etc., can solve the problems of limiting the variety of materials which may be deposited, mechanical connections may not be made to the layer built using a photolithographic layer, and the printing is generally limited to placing exceedingly thin layers of ink. to achieve the effect of enhancing deposition

Inactive Publication Date: 2005-03-03
OPTOMEC DESIGN CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

In an alternative embodiment, the invention may also comprise a virtual or cascade impactor to remove selected particles from a stream of gas to enhance deposition.

Problems solved by technology

Although ink jet printing offers a relatively versatile and inexpensive process for applying a material to a substrate, ink jet printing is generally limited to placing exceedingly thin layers of ink on paper or cloth which are essentially two-dimensional.
This limited range of viscosity in turn limits the variety of materials which may be deposited.
As a result, mechanical connections may not be made to layer built using a photolithographic layer.
The limitations to Fodel® are: 1) The Fodel® process is purely planar.
No three-dimensional features can be produced.
4) The material costs of the Fodel® process are relatively high.
5) The Fodel® process is limited to features larger than 50 microns.
The problem of providing a method and apparatus for optimal control of diverse material particles ranging in size from individual or groups of atoms to microscopic particles used to fabricate articles having fully dense, complex shapes has presented a major challenge to the manufacturing industry.
Creating complex objects with desirable material properties, cheaply, accurately and rapidly has been a continuing problem for designers.

Method used

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Examples

Experimental program
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Embodiment Construction

I. Direct Write™ Methods & Apparatus

FIG. 1 presents a a schematic view of one of the preferred embodiments of the Direct Write™ System, which comprises methods and apparatus for maskless, mesoscale deposition of a source material on a substrate. Unlike many previous deposition systems which are restricted to the formation of planar layers on a flat substrate, the present invention is capable of forming a wide variety of planar, non-planar, conformal or three-dimensional features on a substrate having virtually any profile or topography.

In one embodiment, the invention comprises a source of material 10 contained by an enclosure 11. Although the a preferred embodiment generally includes a source material in liquid form, the source may comprise any aggregation, mixture, suspension or other combination of any materials in any physical phase. The source of material 10 is contained in a vessel, pool, volume or chamber which is coupled to or in communication with an atomizer 12. In gener...

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Abstract

Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.

Description

FIELD OF THE INVENTION The present invention relates generally to the field of precisely depositing a selected material on a substrate. More specifically, one embodiment of the present invention relates to methods and apparatus for generating discrete particles from a source material, creating parallel streams of discrete particles, and then guiding them onto a substrate to form a planar, conformal or three-dimensional feature on the substrate. BACKGROUND OF THE INVENTION Many industrial processes require the formation of layers of a material on a substrate or base. These processes include Ink let Printing. Photolithography and DuPont's Fodel® technology. Ink Jet Printing Ink jet printing is one well-known process that can be used to apply a layer of one material on a substrate. In most cases, ink jet printing is employed to place tiny droplets of ink onto a sheet of paper to create text or an image. One kind of ink jet printer employs “thermal bubble” or “bubble jet” technolog...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B05D5/12B41J2/015B41J2/02B41J29/38C23C4/12C23C18/00C23C24/04H01L21/60H05K3/10
CPCC23C24/04B41J2/435H01L24/81H01L2224/13099H01L2224/24011H01L2224/76155H01L2224/81801H01L2224/82H01L2224/85H01L2224/86H01L2924/01002H01L2924/01013H01L2924/01015H01L2924/01018H01L2924/01022H01L2924/01025H01L2924/01027H01L2924/0103H01L2924/01046H01L2924/01047H01L2924/01056H01L2924/01074H01L2924/09701H01L2924/14H01L2924/19041H01L2924/19042H01L2924/19043H01L2924/30107H01L2924/3025H05K3/102H01L2924/01005H01L2924/01006H01L2924/01023H01L2924/01033H01L2924/01087B41J2/215H01L24/11H01L2924/12042B41J2/415H01L2924/00C23C4/12
Inventor RENN, MICHAEL J.
Owner OPTOMEC DESIGN CO
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