Formation of conductive templates employing indium tin oxide

Inactive Publication Date: 2005-05-12
MOLECULAR IMPRINTS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0005] The present invention is directed to a conductive template and of a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it

Problems solved by technology

However, indium tin oxide is difficult to pattern due to its resistance to etch.

Method used

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  • Formation of conductive templates employing indium tin oxide
  • Formation of conductive templates employing indium tin oxide
  • Formation of conductive templates employing indium tin oxide

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Embodiment Construction

[0025]FIG. 1 depicts a lithographic system 10 in accordance with one embodiment of the present invention that includes a pair of spaced-apart bridge supports 12 having a bridge 14 and a stage support 16 extending therebetween. Bridge 14 and stage support 16 are spaced-apart. Coupled to bridge 14 is an imprint head 18, which extends from bridge 14 toward stage support 16 and provides movement along the Z-axis. Disposed upon stage support 16 to face imprint head 18 is a motion stage 20. Motion stage 20 is configured to move with respect to stage support 16 along X- and Y-axes. It should be understood that imprint head 18 may provide movement along the X- and Y-axes, as well as the Z-axis, and motion stage 20 may provide movement in the Z-axis, as well as the X- and Y-axes. An exemplary motion stage device is disclosed in U.S. patent application Ser. No. 10 / 194,414, filed Jul. 11, 2002, entitled “Step and Repeat Imprint Lithography Systems,” assigned to the assignee of the present inve...

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Abstract

The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.

Description

BACKGROUND OF THE INVENTION [0001] The field of invention relates generally to imprint lithography. More particularly, the present invention is directed to reducing the time required to fill the features of a template with imprinting material during imprint lithography processes. [0002] Micro-fabrication involves the fabrication of very small structures, e.g., having features on the order of micro-meters or smaller. One area in which micro-fabrication has had a sizeable impact is in the processing of integrated circuits. As the semiconductor processing industry continues to strive for larger production yields while increasing the circuits per unit area formed on a substrate, micro-fabrication becomes increasingly important. Micro-fabrication provides greater process control while allowing increased reduction of the minimum feature dimension of the structures formed. Other areas of development in which micro-fabrication has been employed include biotechnology, optical technology, mec...

Claims

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Application Information

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IPC IPC(8): C03C17/34G03F7/00
CPCB82Y10/00B82Y40/00C03C17/3417G03F7/0002C03C2218/31C03C2218/328C03C2217/77
InventorSREENIVASAN, SIDLGATA V.MCMACKIN, IAN M.CHOI, BYUNG-JINVOISIN, RONALD D.
OwnerMOLECULAR IMPRINTS