Method for forming deposition film and method for producing photovoltaic device
a technology of deposition film and photovoltaic device, which is applied in the direction of electrolytic inorganic material coating, superimposed coating process, coating, etc., can solve the problem that the deposition film on the substrate does not exhibit a satisfactory textur
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example 1
[0073] A zinc oxide layer (transparent conductive layer) 203 as shown in FIG. 2 was formed with a roll-to-roll type apparatus shown in FIG. 3.
[0074] The roll-to-roll type apparatus included a delivery roller 301, a take-up roller 302, a rolled substrate 303, a transport roller 304, a zinc oxide deposition bath 305 containing a solution 306 for depositing the zinc oxide film, an counter electrode 307, a power supply 308, a rinse bath 309 containing water 310, a water shower 311, a drier oven 312, an infrared heater 313, and a masking plate 314 for preventing film deposition on the rear surface of the substrate 303.
[0075] In the present example, silver was deposited to a 200 nm thick metal layer (rear reflector) 202 in advance on a rolled SUS4302D support (acting as the substrate 201 shown in FIG. 2) with a DC magnetron sputtering apparatus for the roll-to-roll system. In addition, a zinc oxide film was deposited to a thickness of 100 nm on the metal layer 202 at a substrate tempera...
example 2
[0085] Electrolytic deposition under the secondary conditions was performed with the anode or counter electrode 307 and the cathode or substrate 303 at a current density of 24 mA / cm2 (2.4 A / dcm2). Other conditions were the same as in Example 1. Evaluation was also performed in the same manner as in Example 1. The results were shown in the Table.
example 3
[0086] In deposition under the secondary conditions, the substrate was transported at a rate of 1,000 mm / min. Other conditions were the same as in Example 1. Evaluation was also performed in the same manner as in Example 1. The results were shown in the Table.
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