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Device and system for pressure sensing and control

a technology of pressure sensing and control, applied in fluid pressure measurement, instruments, transportation and packaging, etc., can solve the problems of increased risk of signal interference, unregulated pressure, and unusable batch of circuits, so as to reduce process chamber downtime, less or no interference, and reduce signal interference

Inactive Publication Date: 2005-09-22
MYKROLIS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009] Embodiments of the present invention provide devices that reduce or eliminate the disadvantages associated with prior art pressure control devices and systems. More particularly, embodiments of the present invention provide devices and systems in which pressure sensing and pressure control capabilities are integrated.
[0013] The present invention provides technical advantages over prior art process control systems by reducing signal interference. Because the pressure controller is integrated with a gauge, there are fewer cables in which interference can occur. Additionally, because the pressure controller is not located at a valve drive, the pressure controller will receive less or no interference from the valve drive motor.
[0014] The present invention provides another technical advantage by reducing process chamber downtime. Downtime can be decreased because the gauge with the integrated pressure control capability can easily be switched out or replaced.
[0015] The present invention provides yet another important technical advantage by reducing cabling. By reducing cabling, the costs associated with cabling are also reduced.
[0016] The present invention provides yet another important technical advantage by saving space.
[0017] The present invention provides yet another important technical advantage by reducing the effects of system vibration on the pressure controller, thereby increasing reliability.

Problems solved by technology

This can produce an unusable batch of circuits.
Pressure is typically not regulated, however, by changing the pumping characteristics of downstream vacuum pumps.
Due to the increased number of cables there is a greater chance a signal will encounter interference from the power cable or power source.
Additionally, the large number of cables required for system 20 can be exceedingly expensive and can require a significant amount of setup time.
However, system 40 also suffers from several deficiencies.
A major deficiency for system 40 is that valve 28 can vibrate, sometimes significantly, causing noise in signals produced by vacuum pressure controller 26.
The signal noise created by the vibrations can lead to a reduction in accuracy.
Additionally, because valve drive 30 generally utilizes a high-voltage DC motor to throttle valve 28, pressure vacuum controller 26 can experience significant interference that can reduce the accuracy of overall pressure control.
Thus, although interference due to extensive cabling is reduced, overall interference can increase.
A further disadvantage of system 40 is that valve 28 and valve drive 30 are usually difficult to maintain and replace.
Because pressure vacuum controller 26 is combined with valve drive 30, pressure vacuum controller 26 is, consequently, also difficult to maintain or replace.
If there is a fault in pressure vacuum controller 26, system 40 may have to be shut down for a significant period of time, leading to potentially millions of dollars in lost profit.

Method used

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  • Device and system for pressure sensing and control
  • Device and system for pressure sensing and control
  • Device and system for pressure sensing and control

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Embodiment Construction

[0024] Preferred embodiments of the present invention are illustrated in the FIGUREs, like numerals being used to refer to like and corresponding parts of the various drawings.

[0025] Pressure controllers are commonly used in semiconductor manufacturing as part of a control process to govern gas pressure within a process chamber. A pressure gauge can read the gas pressure within the process chamber and a pressure controller can compare the detected or measured pressure with a set point. A difference between the detected pressure and the set point can cause the pressure controller to generate an electric signal to open or close a valve, thereby controlling chamber pressure. Embodiments of the present invention provide a pressure gauge with integrated pressure control capability. Because pressure gauges according to the teachings of the present invention include integrated pressure control capability, the need for a separate pressure controller is eliminated.

[0026]FIG. 3 illustrates ...

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Abstract

Embodiments of the present invention provide devices and systems in which pressure sensing and pressure control capabilities are integrated. One embodiment of the present invention can include a device for pressure sensing and control comprising a sensor portion operable to sense a pressure and a control portion. The control portion can be operable to compare the sensed pressure to a set point; generate a control signal based on a difference between the sensed pressure and the set point; and output the control signal. The sensor portion and the control sensor portion and control portion can be integrated in a housing.

Description

TECHNICAL FIELD OF THE INVENTION [0001] This invention relates generally to systems for pressure monitoring and control. More particularly, the present invention relates to a gauge with integrated pressure control capability. BACKGROUND OF THE INVENTION [0002] Many of the processes used to manufacture computer chips or integrated circuits take place at a controlled pressure that is less than atmospheric pressure. If the pressure changes, even by a small amount, the properties of the circuits being worked upon can change. This can produce an unusable batch of circuits. Therefore, to ensure batch quality, pressure levels in the process chamber must be controlled with a reasonable degree of accuracy. Typically, the pressure is continuously controlled through a feedback control loop process. One of the most common systems to control pressure utilized by the semiconductor manufacturing industry is illustrated in FIG. 1. [0003]FIG. 1 is a diagrammatic representation of a portion of typica...

Claims

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Application Information

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IPC IPC(8): B65D51/18F16K37/00
CPCF16K37/0091
Inventor GOODMAN, DANIEL A.
Owner MYKROLIS CORP