System and method for inspecting a workpiece surface by analyzing scattered light in a back quartersphere region above the workpiece
Patent Information
- Authority / Receiving Office
- US ยท United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- ADE CORPORATION
- Publication Date
- 2006-08-31
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] The present application claims the benefit of the filing date of U.S. Provisional Patent Application No. 60 / 638,529, filed Dec. 19, 2004, currently pending, the entire disclosure of which is incorporated herein by reference.STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
[0002] N / A BACKGROUND OF THE INVENTION
[0003] 1. Field of the Invention
[0004] The present invention relates to technology for the inspection of a surface or surfaces of a workpiece, such as a semiconductor wafer, chip, or the like. More particularly, it relates to apparatus and methods for inspection of such workpiece surfaces using electromagnetic energy, e.g., light, to scan the surface to obtain characteristics of the surface or other information concerning the surface.
[0005] 2. Description of the Related Art
[0006] There are a number of applications in which it is desirable or advantageous to inspect a surface or surfaces of a workpiece to obtain in...