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Exposure apparatus and method for producing device

a technology of exposure apparatus and producing device, which is applied in the direction of microlithography exposure apparatus, printers, instruments, etc., can solve the problems of insufficient margins, and difficulty in matching substrate surfaces with respect to the image plane of projection optical systems, etc., to achieve the effect of suppressing the deterioration of pattern images

Inactive Publication Date: 2007-02-01
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides an exposure apparatus and method for producing devices based on a predetermined pattern image, which suppresses the deterioration of the pattern image caused by bubbles in the liquid between the projection optical system and the substrate during the exposure process. The exposure apparatus includes a liquid supply unit that supplies liquid to the space between the projection optical system and the substrate, a gas-removing unit that removes gas components from the liquid, and a bubble-suppressing unit that prevents bubbles from forming in the liquid. The bubble-suppressing unit can include a degassing unit that removes any gas from the liquid. The exposure process can be performed with the bubble-suppressed liquid, resulting in a high pattern accuracy of the device being produced.

Problems solved by technology

If the depth of focus δ is too narrowed, it is difficult to match the substrate surface with respect to the image plane of the projection optical system.
It is feared that the margin is insufficient during the exposure operation.
As a result, the pattern image, which is to be formed on the substrate, is deteriorated.

Method used

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  • Exposure apparatus and method for producing device
  • Exposure apparatus and method for producing device
  • Exposure apparatus and method for producing device

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first embodiment

[0038] With reference to FIG. 1, an exposure apparatus EX comprises a mask stage MST which supports a mask M, a substrate stage PST which supports a substrate P, an illumination optical system IL which illuminates, with an exposure light beam EL, the mask M supported by the mask stage MST, a projection optical system PL which performs projection exposure for the substrate P supported by the substrate stage PST with an image of a pattern of the mask M illuminated with the exposure light beam EL, and a control unit CONT which collectively controls the overall operation of the exposure apparatus EX.

[0039] The embodiment of the present invention will now be explained as exemplified by a case of the use of the scanning type exposure apparatus (so-called scanning stepper) as the exposure apparatus EX in which the substrate P is exposed with the pattern formed on the mask M while synchronously moving the mask M and the substrate P in mutually different directions (opposite directions) in ...

second embodiment

[0066] Next, an explanation will be made with reference to FIG. 5 about a second embodiment of the exposure apparatus EX of the present invention. In the following description, the same or equivalent constitutive parts as those of the embodiment described above are designated by the same reference numerals, any explanation of which is simplified or omitted. The characteristic feature of this embodiment is that a pressure-reducing unit 23 is provided in place of the heating unit 21.

[0067] As shown in FIG. 5, the liquid supply unit 1 includes a filter 20 which removes any foreign matter from the liquid 50, for example, by filtering the liquid 50 recovered by the liquid recovery unit 2 in order to avoid any pollution of the substrate P and the projection optical system PL and / or avoid any deterioration of the pattern image projected onto the substrate P, the pressure-reducing unit 23 which degasses the liquid 50 by reducing the pressure of the liquid 50 from which the foreign matter h...

third embodiment

[0073] An explanation will be made with reference to FIGS. 6 and 7 about a third embodiment of the exposure apparatus EX of the present invention. The exposure apparatus of this embodiment is provided with a membrane degassing unit 24 and a heating unit 25 as shown in FIG. 6 in place of the heating unit of the liquid supply unit in the first embodiment. In the following description, the same or equivalent constitutive parts as those of the embodiment described above are designated by the same reference numerals, any explanation of which is simplified or omitted.

[0074]FIG. 6 shows an arrangement of the liquid supply unit 1. As shown in FIG. 6, the liquid supply unit 1 includes a filter 20 which removes any foreign matter or the like from the liquid 50 recovered by the liquid recovery unit 2, for example, by filtering the liquid 50 recovered by the liquid recovery unit 2 in order to avoid any pollution of the substrate P and the projection optical system PL and / or avoid any deteriora...

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Abstract

An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by any bubble in the liquid. The exposure apparatus includes a liquid supply unit 1 which fills at least a part of the space between the projection optical system and the substrate with a liquid 50, and exposes the substrate by projecting an image of a pattern onto the substrate via the projection optical system. The liquid supply unit 1 includes a degassing unit 21 which suppresses the generation of the bubble in the liquid 50.

Description

CROSS-REFERENCE [0001] This application is a Continuation Application of application Ser. No. 11 / 144,827 filed Jun. 6, 2005, which in turn is a Continuation Application of International Application No. PCT / JP03 / 015407 which was filed on Dec. 2, 2003 claiming the conventional priority of Japanese patent Application No. 2002-357961 filed on Dec. 10, 2002, No. 2003-002820 filed on Jan. 9, 2003, and No. 2003-049367 filed on Feb. 26, 2003.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to an exposure apparatus for exposing a substrate with a pattern image projected by a projection optical system in a state in which at least a part of a space between the projection optical system and the substrate is filled with a liquid. The present invention also relates to a method for producing a device based on the use of the exposure apparatus. [0004] 2. Description of the Related Art [0005] Semiconductor devices and liquid crystal display devices ar...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G03B27/42G03F7/20
CPCG03F7/70341
Inventor OWA, SOICHI
Owner NIKON CORP
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