Electrochemical deposition method, electrochemical deposition apparatus, and microstructure
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embodiment 1
[0101]FIG. 1 is an explanatory drawing of an electrochemical deposition method according to a first embodiment of the invention. Incidentally, in this embodiment, a description of a case where current oscillation as one form of electrochemical oscillation is controlled will be presented.
[0102] As shown in FIG. 1, conductive metal substrates, i.e., a positive electrode 1 and a negative electrode 2 are arranged oppositely in a liquid tank 5 containing an electrolytic (acid) solution (hereinafter referred to as “solution”) 4 in which plural substances (in this case, Cu and Sn are used) are dissolved in an ionic state, and then a predetermined voltage is applied between the positive electrode 1 and the negative electrode 2. In addition to the two electrodes 1 and 2, a reference electrode 3 is also arranged in the liquid tank 5 and the potential between the negative electrode 2 and the reference electrode 3 is measured. Since the solution 4 can be considered as a conductor, the potentia...
embodiment 2
[0126] In the first embodiment, the oscillation phenomenon is produced by mixing the reaction inhibitor into the solution to couple the negative differential resistance induced by the reaction inhibitor with the potential drop of the solution. On the other hand, the potential of or the current into a working electrode can be controlled such that the deposition of substances dissolved in a solution onto the surface of the working electrode proceeds under the diffusion limited control of the substances; a description of such a method will be presented below as a second embodiment, that is, a method for forming a lattice structure on the surface of a working electrode through the control of potential oscillation will be described below.
[0127]FIG. 9 is an explanatory drawing of the electrochemical deposition method according to the second embodiment of the invention. Incidentally, in this embodiment, a description of a case where potential oscillation as one form of electrochemical osc...
embodiment 3
[0149]FIG. 21 is an explanatory drawing of the structure of an electrochemical deposition apparatus according to a third embodiment of the invention. Incidentally, in this embodiment, a description of the control of potential oscillation as one form of electrochemical oscillations will be presented.
[0150] In the electrochemical deposition apparatus according to the third embodiment of the invention, the conductive metal substrates, i.e., the positive electrode 11 and the negative electrode 12 are oppositely arranged in the liquid tank 15 containing the electrolytic solution (hereinafter referred to as “solution”) 14 in which substances (in this case, metals such as Sn and Zn are used) are dissolved in an ionic state and a current is fed between the negative electrode 12 and the positive electrode 11. And further, in addition to the two electrodes 11 and 12, the reference electrode 13 is arranged in the liquid tank 15. Furthermore, the deposition apparatus is provided with a detecti...
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Abstract
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