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Positioning apparatus

Active Publication Date: 2012-06-28
CLOUD NETWORK TECH SINGAPORE PTE LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0004]Positioning apparatus are widely applied in many manufacturing fields, such as welding processes, milling processes, and the like, for positioning the workpiece. A commonly used positioning apparatus generally is large in size and has low precision. In use, the workpiece is fixedly placed on the positioning apparatus manually or by a manipulator, the position and angle of the workpiece cannot be adjusted during the manufacturing process, thus, the operator needs to process or handle the workpiece from different directions and angles thereby decreasing the manufacturing efficiency and requiring to have unnecessary widened tolerances in the quality specification of the workpiece.

Problems solved by technology

A commonly used positioning apparatus generally is large in size and has low precision.
In use, the workpiece is fixedly placed on the positioning apparatus manually or by a manipulator, the position and angle of the workpiece cannot be adjusted during the manufacturing process, thus, the operator needs to process or handle the workpiece from different directions and angles thereby decreasing the manufacturing efficiency and requiring to have unnecessary widened tolerances in the quality specification of the workpiece.

Method used

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Embodiment Construction

[0010]Referring to FIGS. 1 through 3, an embodiment of a positioning apparatus 100 is shown for positioning a workpiece (not shown) during a mechanical manufacturing process. The positioning apparatus 100 includes a base plate 10, an elevating mechanism 30, and a deflection mechanism 50 mounted on the elevating mechanism 30. The base plate 10 is a substantially H-shaped plate in the illustrated embodiment, and is configured for supporting the elevating mechanism 30 and the deflection mechanism 50.

[0011]The elevating mechanism 30 is mounted on the base plate 10, and positioned under the deflection mechanism 50. The elevating mechanism 30 is connected to the deflection mechanism 50 and is configured for adjusting the height of the deflection mechanism 50 relative to the base plate 10. The elevating mechanism 30 includes an elevating board 31, an elevating driver 33, a guiding assembly 35 and at least one limiting rod 37. The elevating board 31 is mounted over the base plate 10, and ab...

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Abstract

A positioning apparatus includes a base plate and a deflection mechanism mounted upon the base plate. The deflection mechanism includes a stationary platform, a rocker assembly and a deflection platform. The stationary platform is mounted over the base plate for placing and positioning a workpiece. The deflection platform is tiltably mounted over the stationary platform via the rocker assembly and the height of the stationary platform itself is adjustable. The rocker assembly comprises a first rocker and a second rocker of different lengths.

Description

BACKGROUND[0001]1. Technical Field[0002]The present disclosure relates to positioning apparatus and, particularly, to a positioning apparatus used for positioning a workpiece during a mechanical manufacturing process.[0003]2. Description of Related Art[0004]Positioning apparatus are widely applied in many manufacturing fields, such as welding processes, milling processes, and the like, for positioning the workpiece. A commonly used positioning apparatus generally is large in size and has low precision. In use, the workpiece is fixedly placed on the positioning apparatus manually or by a manipulator, the position and angle of the workpiece cannot be adjusted during the manufacturing process, thus, the operator needs to process or handle the workpiece from different directions and angles thereby decreasing the manufacturing efficiency and requiring to have unnecessary widened tolerances in the quality specification of the workpiece.[0005]Therefore, there is room for improvement within...

Claims

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Application Information

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IPC IPC(8): B23Q1/64
CPCB23K31/02B23K37/04B23Q3/18B23Q1/4852B23Q1/525B23K37/0435
Inventor WEN, QING-SONGPAN, WEI-FENGMA, JIAN-XINLU, YU
Owner CLOUD NETWORK TECH SINGAPORE PTE LTD
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