Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same

Inactive Publication Date: 2013-10-17
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0027]According to one or more exemplary embodiment of the photoresist composition, the method of manufacturing of a polarizer and the method of manufacturing a display substrate, a photoresist pattern which has a high level of resistance to a dry-etching process using a plasma gas, may be formed. Thus, the reliability of an imprinting or nanoimprinting process for

Problems solved by technology

The polarizer absorbs light irradiated from the backlight assembly, so that the polarizer undesirably has a low level of efficiency and heat-resistance, and is easily deteriorated by an ultraviolet light.
However, a photoresist pattern formed by a conventional p

Method used

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  • Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same

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Embodiment Construction

[0033]It will be understood that when an element or layer is referred to as being “on” or “connected to” another element or layer, the element or layer can be directly on or connected to another element or layer or intervening elements or layers. In contrast, when an element is referred to as being “directly on” or “directly connected to” another element or layer, there are no intervening elements or layers present. As used herein, connected may refer to elements being physically and / or electrically connected to each other. Like numbers refer to like elements throughout. As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items.

[0034]It will be understood that, although the terms first, second, third, etc., may be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms are only used to dis...

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Abstract

A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.

Description

[0001]This application claims priority to Korean Patent Application No. 10-2012-0039496, filed on Apr. 17, 2012, and all the benefits accruing therefrom under 35 U.S.C. §119, the contents of which are herein incorporated by reference in its entirety.BACKGROUND[0002]1. Field[0003]Exemplary embodiments relate to a photoresist composition, a method of manufacturing a polarizer and a method of manufacturing a display substrate using the photoresist composition. More particularly, exemplary embodiments relate to a photoresist composition that may be used in a nanoimprinting process for manufacturing a polarizer, a method of manufacturing a polarizer and a method of a display substrate using the photoresist composition.[0004]2. Description of the Related Art[0005]Generally, a liquid crystal display device is thinner and lighter than a cathode ray tube (“CRT”) display device, such that the liquid crystal display is widely used. However, the liquid crystal display device uses a liquid cryst...

Claims

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Application Information

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IPC IPC(8): G03F7/031G03F7/00G03F7/075
CPCG03F7/031G03F7/0757G03F7/0002G03F7/0007G02B5/30G03F7/004G03F7/0045G03F7/027G02F1/133548G02B1/12G02B5/3058G02F1/133528H01L27/1288
Inventor LEE, KI-BEOMJANG, DAE-HWANTAKAKUWA, ATSUSHI
Owner SAMSUNG DISPLAY CO LTD
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