Composition comprising photochemical acid progenitor and specific squarylium dye

a technology of acid progenitor and specific squarylium dye, which is applied in the direction of photosensitive materials, instruments, photomechanical equipment, etc., can solve the problems of dyes with oxidation potentials greater than about 500 mv and low sensitivity of this system, and achieve good acid generators

Inactive Publication Date: 2003-09-16
IMATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the sensitivity of this system is quite low, i.e., 300-600 mJ / cm.sup.2.
This patent teaches that dyes having oxidation potentials greater than about 500 mV were found not an be good acid generators.

Method used

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  • Composition comprising photochemical acid progenitor and specific squarylium dye
  • Composition comprising photochemical acid progenitor and specific squarylium dye
  • Composition comprising photochemical acid progenitor and specific squarylium dye

Examples

Experimental program
Comparison scheme
Effect test

example 1

A solution consisting of 2 g of 10% Novolak SD-126A (Borden Packaging & Industrial Products, Louisville, Ky.) in methylethylketone, 0.02 g of CYMEL 303 (American Cyanamid Co., Wayne, N.J.), 0.02 g TTT, and 0.003 g Dye 1a was coated with a No. 6 coating rod (R&D Specialties, Webster, N.Y.) onto 200 micron-thick grained and anodized aluminum printing plate base and dried with a heat gun.

A near infrared spectrum (integrating sphere) was taken of a sample of this coating when fresh and after 1 and 2 days at 60.degree. C. The results are given in Table 1.

A fresh sample of the plate and a sample aged 2 days at 60.degree. C. were scanned with the laser diode exposure assembly. Separate areas of the plate were scanned at a rate of 6, 8, and 10 revolutions per second (508, 678, and 848 centimeters per second, respectively). The scanned plates were heated for 60 seconds at 105.degree. C. and developed with PCX positive plate developer (3M, St. Paul, Minn.). For the fresh plate, the coating re...

example 2

Example 1 was repeated except that Dye 1e replaced Dye 1a.

A near infrared spectrum was taken of a sample of this coating when fresh and after 1 and 2 days at 60.degree. C. The results are given in Table 2.

A fresh sample of the plate and a sample aged 2 days at 60.degree. C. were exposed with the laser diode exposure assembly, heated and developed as in Example 1. Both fresh and aged samples left coating on the plate in the exposed areas at all scan rates of 6, 8, and 10 revolutions per second. In addition, there was no coating left in the unexposed areas. There were no signs of degradation of the coating after accelerated aging for 3 days at 60.degree. C. These results indicate that Dye 1e is more stable than Dye 1a in the presence of TTT. This may be due to the higher oxidation potential of Dye 1e (E.sub.1 / 2 =0.68 V vs SCE) relative to Dye 1a (E.sub.1 / 2 =0.51 V versus SCE).

TABLE 2 Absorption spectra of plates before and after accelerated aging at 60.degree. C. Dye .lambda..sub.max ...

example 3.0.00

Example 3. 0.006 g Dye 1a.

Example 4. 0.006 g Dye 1b.

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Abstract

Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.

Description

FIELD OF THE INVENTIONThis invention relates to compositions for the photogeneration of acid. This invention also relates to processes for the photogeneration of acid.BACKGROUNDMany processes are known using a medium which, when irradiated with electromagnetic radiation, generates an acid This acid is then used to cause a change in the properties of the medium, so that exposed and unexposed portions of the medium differ in their properties. For example, many photoresist compositions arc of this type; the acid produced upon exposure to (typically) ultraviolet radiation changes the solubility of the photoresist composition in the solution used to develop the photoresist In most conventional acid-generating photoresist processes, the sensitivity of the medium an the exposing radiation is not of major concern. Exposure is normally effected using powerful ultraviolet sources. In addition, long exposures times can usually be tolerated.Today, many imaging processes are being developed usin...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): G03F7/016G03F7/021C08K5/00C08K5/3465C08K5/5399C08K5/55C08L101/00C09B57/00G03F7/00G03F7/004G03F7/038G03F7/039
CPCC09B57/007G03F7/0045G03F7/0382G03F7/0392Y10S430/146Y10S430/121Y10S430/145Y10S430/127
Inventor BUSMAN, STANLEY C.ELLIS, RICHARD J.HAUBRICH, JEANNE E.RAMSDEN, WILLIAM D.THIEN, TRAN VANCUNY, GREGORY D.
Owner IMATION
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