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Preparation process of nanometer dot array in controllable size with inverse porous nanometer ball template

A nano-dot array and porous template technology, which is applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problems of high quality requirements for anodized aluminum templates, complicated preparation process, and difficult precise control, so as to reduce the occurrence of late defects , a wide range of raw material sources, and the effect of device performance optimization

Inactive Publication Date: 2009-09-09
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This process requires the use of heavy metal dyeing, and the process is complicated
[0007] However, the above methods all have certain limitations: Method 1 obtains a triangular lattice, which has a small effective area and many defects; Method 2 has high requirements on the quality of the anodized alumina template, and the diameter of the nano-dots is controlled by the aperture of the alumina template, which is difficult to control precisely; Sanxu precisely controls the reaction conditions to obtain the appropriate separation state of the copolymer. The preparation process is relatively complicated and the universality is poor.

Method used

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  • Preparation process of nanometer dot array in controllable size with inverse porous nanometer ball template
  • Preparation process of nanometer dot array in controllable size with inverse porous nanometer ball template
  • Preparation process of nanometer dot array in controllable size with inverse porous nanometer ball template

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] 1) Self-assembly of nanospheres on a silicon wafer with a clean surface by the pulling method, using polystyrene-acrylic acid copolymer colloidal spheres with a diameter of 263 nm (the mass ratio of core to shell is 15:1), to obtain a single layer of regular density A row of nanosphere templates, as shown in Figure 1 (A);

[0030] 2) Place the single-layer regular and densely packed nanosphere template in toluene solvent, control the ambient temperature at 0°C and the dissolution time for 0.5 min, take it out and dry to obtain the reversed-phase porous template, as shown in Figure 1(B);

[0031] 3) Place the reversed-phase porous template in the reactive ion etching machine, and use O 2 As the etching gas, the etching pressure is 20Pa, the power is 20W, and the etching time is 3 minutes. A good through-hole structure is obtained to form a deposition channel.

[0032] 4) Using vacuum evaporation technology, 60nm thick metal silver is evaporated on the template.

[003...

Embodiment 2

[0035] 1) The self-assembly of nanospheres was carried out on a silicon wafer with a clean surface by the spin-coating method, using polystyrene-acrylic acid copolymer colloidal spheres with a diameter of 370 nm (the core-shell mass ratio was 19:1), and a single layer of regular density was obtained. row of nanosphere templates;

[0036] 2) Place a single layer of regular and densely packed nanosphere templates in a chloroform solvent, control the ambient temperature at 50°C and dissolve for 20 minutes, take out and dry to obtain a reversed-phase porous template, as shown in figure 2 ;

[0037] 3) Place the reversed-phase porous template in the reactive ion etching machine, and use CF 4As the etching gas, the etching pressure is 50Pa, the power is 5W, and the etching time is 0.5 minutes. A good through-hole structure is obtained to form a deposition channel, as shown in Figure 3(A).

[0038] 4) Evaporating metal nickel with a thickness of 80 nm on the template by using elec...

Embodiment 3

[0041] 1) The self-assembly of nanospheres was carried out on the surface-cleaned silicon wafer by electric field-induced deposition, using polystyrene-acrylic acid copolymer colloidal spheres with a diameter of 455 nm (the core-shell mass ratio was 9:1), and a single layer of regular density was obtained. row of nanosphere templates;

[0042] 2) Place a single layer of regular and densely packed nanosphere templates in a xylene solvent, control the ambient temperature at 80°C and dissolve for 30 minutes, take it out and dry to obtain a reversed-phase porous template, as shown in figure 2 ;

[0043] 3) Place the reversed-phase porous template in a reactive ion etcher, and use Cl 2 As the etching gas, the etching pressure is 25Pa, the power is 30W, and the etching time is 10 minutes. A good through-hole structure is obtained to form a deposition channel.

[0044] 4) Using DC magnetron sputtering technology, sputtering 100nm thick alloy FePt on the template.

[0045] 5) The ...

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Abstract

The invention discloses a method for preparing a size-controllable nano-dot array by using a nano-sphere reverse-phase porous template, and discloses a method for preparing a nano-dot array with a controllable density and unit size by using a reverse-phase nano-sphere template and belonging to the field of nanolithography. First, through the self-assembly of monodisperse core-shell structure nanospheres, a single layer of regular and densely packed nanosphere templates are obtained. Reversed-phase porous arrays were obtained by selective dissolution. Reactive ion etching technology is used to modify the anti-phase holes in the template to obtain through-through deposition channels. Then a thin film is deposited on the template by thin film preparation technology, and the porous template is dissolved in a selective solvent to obtain a regular array of circular nano-dots. Through the combination with the preparation technology of thin films of different materials, high-density and size-controllable dot arrays of different materials can be prepared by using the preparation method of the nano-dot array, which can be used for device preparation and performance optimization based on the nano-dot array.

Description

technical field [0001] The technology belongs to the field of nanometer photolithography. In particular, it relates to the use of core-shell structure nanosphere reversed-phase porous array template combined with post-reactive ion etching modification to obtain a nano-dot array preparation method suitable for high-density unit size controllable. Background technique [0002] Two-dimensional structured nanodot arrays have high application value due to their special structure and performance, and have been widely used in many fields such as high-density quantum magnetic recording, photonic crystals, biosensors and optoelectronic devices. So far, there are many ways to prepare nanodot arrays. At present, the top-down photolithography mask technology is commonly used. This method has high precision and good controllability, but the cost is high and the equipment is complicated; there are also electron beam etching and focused ion beam etching methods. These The method is compl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B82B3/00
Inventor 钱骏庹新林袁俊王晓工
Owner TSINGHUA UNIV
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