Analyzing electromagnet

Abstract

In the analysis electromagnet 40 , each of the magnetic poles having a curved plan view shape therein is divided into three partial magnetic poles 81 to 83 along the propagation direction of the ion beam 2 . Towards the outside of the bend, the gap of the first and third partial pole pairs 81, 83 as counted from the entrance of the ion beam 2 widens, and towards the inside of the bend, the gap of the second partial pole pair 82 widens.

Description

[0001] This application claims priority from Japanese Patent Application No. 2006-160991 filed on Jun. 9, 2006 at the Japan Patent Office. This priority application is hereby incorporated by reference in its entirety. technical field [0002] The present disclosure relates to an analysis electromagnet to be used in an ion implantation apparatus, an ion doping (registered trademark) apparatus, etc. and to deflect an ion beam so as to perform momentum analysis of the ion beam, and more particularly, to analysis of a ribbon ion beam Momentum analysis of electromagnets. Background technique [0003] For example, Patent Document 1 (UM-A-64-7753 (FIG. 1)) discloses an example of a related art analysis electromagnet that deflects an ion beam in order to perform momentum analysis (such as mass analysis) of the ion beam, and hereinafter the same applies ). [0004] 11 shows that, in the analytical electromagnet of this related art, between magnetic poles in which the shape of the c...

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Problems solved by technology

[0018] In addition to the above-mentioned problems in the analysis slit 20, there arises a problem that when a process such as ion implantation is applied to a target (such as a semiconductor substrate or a glass substrate) by using the ion beam 2 having a shape distorted as described above, Uniformity of damage process

However, there is another problem: the complex structure

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