Unlock instant, AI-driven research and patent intelligence for your innovation.

Resin composition capable of polymerizing

A polymeric resin and composition technology, applied in coatings, instruments, organic chemistry, etc., can solve the problems of reduced transmittance of coating films or patterns, high sublimation, and pollution inside baking ovens, etc.

Active Publication Date: 2012-07-18
SUMITOMO CHEM CO LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, when such a composition is used, there is a problem that although sufficient sensitivity is obtained, the transmittance of the resulting coating film or pattern decreases because of the maximum absorption wavelength in the range of 350 to 450 nm
If the sublimation is high, it will contaminate the inside of the baking furnace in the post-baking, resulting in a decrease in the yield of the product

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Resin composition capable of polymerizing
  • Resin composition capable of polymerizing
  • Resin composition capable of polymerizing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0244] The following components were mixed: 169 parts (55 parts in terms of solid content) of the resin solution (A) containing the resin (i) obtained in Synthesis Example 1, 45 parts of dipentaerythritol hexaacrylate (B), 4 parts 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (C), 0.5 part 2-(2-naphthoylmethylene)- 3-Methylbenzothiazoline (C-1), 4 parts of pentaerythritol tetrathiopropionate (T), 56 parts of propylene glycol monomethyl ether acetate (D) and 40 parts of 3-ethoxyethylpropionate acid ester to obtain polymerizable resin composition 1.

[0245]

[0246]

[0247] A 2-inch glass substrate (#1737; manufactured by Corning) was washed sequentially with a neutral detergent, water, and alcohol, and then dried. On this glass substrate, the polymerizable resin composition 1 was spin-coated and 200 mJ / cm 2 (405 nm) exposure, developed and washed with water so that the film thickness after post-baking was 3.0 μm, and then pre-baked at 100° C. for 3 minutes...

Embodiment 2

[0260] Polymerizable resin composition 2 was obtained in the same manner as polymerizable resin composition 1 to provide the formulations shown in Table 1, and evaluated. The results are described in Table 2.

Embodiment 3

[0262] Polymerizable resin composition 3 was obtained in the same manner as in Example 1 to provide the formulations shown in Table 1, and evaluated. The results are described in Table 2.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
absorption wavelengthaaaaaaaaaa
thicknessaaaaaaaaaa
dispersityaaaaaaaaaa
Login to View More

Abstract

A polymerisable resin compound, which comprises (A) resin, (B) polymerisable compound, (C) initiating agent, (C-1) initiating adjuvant, (T) polyfunctional mercaptan compound and (D) solvent, the initiating adjuvant (C-1) contains compound of formula (V), in which the point line showed by the X means aromatic loop, Y means oxygen atom or sulfur atom, R1 means alkyl containing one to six carbon atoms, R2 means the alkyl containing one to twelve carbon atoms replaced by halogen atom or the aryl containing six to twelve carbon atoms replaced by halogen atom.

Description

technical field [0001] The present invention relates to a polymerizable resin composition. Background technique [0002] It has been proposed to form a spacer (photospacer) between a color filter and an array substrate constituting a display such as a liquid crystal display, a touch screen and the like by photolithography using a photosensitive resin. According to this method, the spacer can be formed at any position. [0003] Currently, light emitted from mercury lamps used as light sources for lithography typically has a high intensity spectrum at about 436 nm, about 408 nm, about 365 nm, about 313 nm, about 315 nm, about 313 nm, and the like. [0004] As an exposure apparatus used in an actual photospacer forming method, a proximity exposure apparatus and a stepper are generally used, and in many cases, when the cut-off light of a short wavelength is less than 350 nm, a recent exposure apparatus is used. Close-up exposure device. In the stepper, light of about 408 nm a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08L101/02C09D201/02C08K5/46C08K5/35
CPCC07D263/52C07D277/60C07D303/06C08F2/04C08F2/44C08F20/06C08F20/10C08F22/02C08F22/04C08F22/10C08F220/04C08F220/12C08J5/2231G02F1/1339G03F7/031
Inventor 武部和男
Owner SUMITOMO CHEM CO LTD