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Substrate cleaning device, substrate cleaning method and substrate manufacture method

A cleaning device, a technology for a manufacturing method, applied in cleaning methods and utensils, cleaning methods using tools, chemical instruments and methods, etc., can solve problems such as inability to uniformly clean substrates, brushes bending, and changing

Inactive Publication Date: 2011-08-17
HITACHI HIGH-TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if the brush is made longer, the self-weight of the brush will increase, causing the brush to bend
Therefore, the rotation axis of the brush is deviated, and the pressure of the brush against the substrate fluctuates, resulting in the inability to clean the substrate uniformly

Method used

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  • Substrate cleaning device, substrate cleaning method and substrate manufacture method
  • Substrate cleaning device, substrate cleaning method and substrate manufacture method
  • Substrate cleaning device, substrate cleaning method and substrate manufacture method

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Embodiment Construction

[0035] figure 1 It is a schematic configuration diagram showing a substrate cleaning apparatus according to an embodiment of the present invention. and, figure 2 It is a perspective view of main parts of a substrate cleaning apparatus according to an embodiment of the present invention. The substrate cleaning device is composed of a cylinder 10, an upper brush 20, a motor 22, an upper brush holding mechanism, a lower brush 30, a motor 32, a lower brush holding mechanism, an upper brush elevating mechanism and an upper brush reciprocating mechanism.

[0036] exist figure 1 1 , the substrate 1 is mounted on a plurality of rollers 10 , and the rollers 10 are rotated to move in the substrate moving direction indicated by arrow A. The rollers 10 are provided at constant intervals in the substrate moving direction, and are rotated at a predetermined speed by a drive mechanism not shown.

[0037] In addition, in this embodiment, the substrate 1 is moved in a horizontal state, bu...

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PUM

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Abstract

The present invention can wash big base board uniformly with high washing force. An upper brush (20) is arranged with a rotary axis (21) and rotates by the drive of a motor (22). A bearing block (23a, 23b) supports the rotary axis (21) of the upper brush (20) with rotatable mode. A guiding device (24a, 24b) guides the bearing block (23a, 23b) to the direction of the axis of the rotary axis (21). Because of keeping the upper brush (20) move to the axis direction of the rotary axis (21) on the one hand as well as making the brush rotate on the other hand, even though the upper brush (20) occursbend when rotating, it is able to make the upper brush (20) move to the axis direction of the rotary axis (21) during rotating process, so as to eliminate the bend of the upper brush (20). Thus, the present invention can prevent the rotary axis (21) from deflecting, and fixes the upper brush (20) through the pressure contacting to the base board (1).

Description

technical field [0001] The present invention relates to a substrate cleaning device for cleaning a panel substrate for a flat panel display device, a substrate cleaning method, and a substrate manufacturing method using the substrate cleaning device and substrate cleaning method. A substrate cleaning device and a substrate cleaning method which have a brush and are good for cleaning a large substrate, and a substrate manufacturing method using the substrate cleaning device and the substrate cleaning method. Background technique [0002] In the manufacturing process of panel substrates for various flat panel display devices such as liquid crystal display devices and plasma display devices, circuit patterns, color filters, and the like are formed on the substrates by chemical treatment such as developing and etching. At this time, if dirt or foreign matter is present on the substrate, circuit patterns or color filters cannot be formed satisfactorily. Therefore, the substrate m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1333H01L21/00B08B1/02B08B1/20
Inventor 森口善弘小笠原和义井崎良釜石孝生
Owner HITACHI HIGH-TECH CORP