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Slit coating apparatus

A coating device, a slit-type technology, applied in the direction of photo-engraving process coating equipment, etc.

Active Publication Date: 2010-12-15
WEIHAI DMS OPTICAL ELECTROMECHANICAL CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in this way, when the wiping part moves from one end to the other end along the cutting direction of the discharge port, secondary pollution will be caused due to the overflow of the photosensitive liquid.

Method used

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Embodiment Construction

[0040] Since the embodiments of the present invention can be implemented in various forms, the scope of claims of the present invention is not limited to the following embodiments.

[0041] figure 1 It is a schematic diagram of the overall structure of the slit coating device of the present invention, and the symbol 2 in the figure represents the nozzle body.

[0042] The top view shape of the nozzle body 2 is a rectangle, which is suitable for the usual slit coating operation, and is fixed on one side of the workbench M. The table M is equipped with a conveying device M1 such as a roller conveyor, and has the nozzle body 2 . While the substrate G for a flat panel display (hereinafter referred to as "substrate") is being conveyed by the conveying device M1, a coating operation of applying a photosensitive liquid W such as a photoresist to the substrate G is performed.

[0043] like figure 1 As shown, the nozzle body 2 can be fixed on the support table M2 installed on the ...

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Abstract

The present invention discloses a narrow slit type coating apparatus which is adapted to the coating work for coating light sensitive liquid such as light resist agent for photolithography on a substrate for flat panel display and can remove the light sensitive liquid evenly attached at the nozzle discharge opening. The apparatus comprises: a worktable for coating the substrate on a work surface;a nozzle body with a slit type discharge opening fixed on one side of the worktable for coating the light sensitive liquid to the substrate; a cleaning roller with a cylindrical cleaning component and arranged at the lower part of the nozzle body in the form of crossing the cutting direction of the discharge opening; a first drive part for rotating the cleaning roller to one direction to make thecleaning component rotate around the axes; a second drive part for moving the cleaning roller to make the cleaning roller move along the cutting direction of the discharge opening while rotating under the action of the first drive part; and a third drive part works with the first drive part and the second drive part to make the cleaning roller move in the direction vertical to the slit of the discharge opening.

Description

technical field [0001] The present invention relates to a slit-type coating device, in particular to a coating operation suitable for coating a photosensitive liquid such as a photoresist on a substrate for a flat panel display, and can easily remove particles adhering to a nozzle discharge port. A slit coating device for photosensitive liquid. Background technique [0002] Generally, in the manufacturing process of a substrate for a flat panel display, the step of forming a predetermined pattern on the surface of the substrate is mainly performed by photolithography. In the photolithography method, before the exposure, development, and etching processes, a liquid photosensitive material (sensitive material) such as photoresist is applied to the surface of the substrate to a certain thickness. [0003] In the coating step, the photosensitive liquid is usually applied to the substrate while the substrate is moving by using a nozzle having a slit-type discharge port. The dev...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/16
Inventor 金银洙姜智银吴相泽
Owner WEIHAI DMS OPTICAL ELECTROMECHANICAL CO LTD
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