Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Setting arrangement for high artesian area ultra-deep foundation pit

A high-pressure, deep foundation pit technology, applied in infrastructure engineering, excavation, construction, etc., can solve the problems of large impact and difficult construction accuracy to meet the requirements, so as to reduce engineering risks, protect the surrounding environment, and save engineering costs. Effect

Inactive Publication Date: 2010-09-01
SHANGHAI TUNNEL ENGINEERING RAILWAY TRANSPORTATION DESIGN INSTITUTE
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In terms of structural form, this setting structure can be applied to deep foundation pit projects in areas with high confined water, but it has a relatively large impact on the surrounding environment during the construction process, and in projects with high precision requirements, its construction accuracy difficult to meet

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Setting arrangement for high artesian area ultra-deep foundation pit
  • Setting arrangement for high artesian area ultra-deep foundation pit
  • Setting arrangement for high artesian area ultra-deep foundation pit

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0028] Embodiment: In this embodiment, the underground diaphragm wall (or bored pile, occlusal pile) is used as the enclosure structure, and the internal support (steel support or concrete support) is used as the support structure. Under the premise of open excavation construction to a certain elevation (that is, no depressurization treatment for the confined water layer or only slightly lowering the confined water head), during the excavation process of the open cut method, the purlins, supports and upper side walls are poured, and then Inject water into the foundation pit (the height of the water head is based on the fact that the excavation to the bottom of the pit can resist the pressurized water and meet a certain safety factor), and carry out underwater excavation construction. The bottom cover concrete is poured, and then the water in the foundation pit is pumped out, the bottom plate is poured and the remaining internal structure is built back.

[0029] The structure o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the track traffic and tunnel category, in specific to an arrangement structure of superdeep foundation pits in high pressure water areas, which adopts underground continuous walls (or drilling piles, drill biting piles and corresponding waterproof curtains) as enclosure structure, and inner supports (steel supports or concrete supports ) as support structures; during the course of foundation pit excavation, performing reverse execution on surrounding purlins, supports and side walls; placing precast concrete beams or steel beams in seal concrete, so as to solve shortcomings of the prior art. The invention mainly has the advantages that: on the one hand, the invention can avoid the difficulty in penetration in execution of enclosure structure (in particular to waterproof curtains) when confined aquifers are rather thick and deep; on the other hand, the invention can also avoid all kinds of difficulties in pressure drop of pressure water. Therefore, the invention can save construction cost and lower construction risk as well as protect surrounding environments.

Description

technical field [0001] The invention relates to rail transit and tunnels, in particular to an arrangement structure for ultra-deep foundation pits in areas with high confined water. Background technique [0002] In the prior art, there are the following configurations for tunnel working wells and intermediate air well foundation pits in confined water areas: [0003] When adopting the top-down construction of the pressure-reducing water open cut frame, the structure is set as follows: the underground diaphragm wall (or bored piles, occlusal piles and corresponding water-proof curtains) is used as the enclosure structure, and the internal support (steel support or concrete support) As a supporting structure, purlins and supports are reversed during the excavation of the foundation pit. After the foundation pit is excavated to the bottom of the pit, the structural floor is poured and then the structural side walls and structural floors of each floor are built back. The disadv...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): E02D17/02
Inventor 曹文宏曹伟飚叶蓉管攀峰肖勤孙建军
Owner SHANGHAI TUNNEL ENGINEERING RAILWAY TRANSPORTATION DESIGN INSTITUTE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com