Clean container latching structure

Abstract

The invention discloses a cleaning container buckling structure which is combined on a cover body of a cleaning container through a demountable buckling part to lead the cover body to close or open in a seat body of the cleaning container. The buckling part comprises an integrated forming main body, a locating part and an elastic buckling arm. The locating part extends along one side of the main body to form an elastic slice; and the elastic slice is provided with a flange, so as to fasten the buckling part on the cover body. The elastic buckling arm is provided with an elastic arm and the end part of the elastic buckling arm is provided with a lateral flange. The lateral flange extends into the seat body to from a buckling state. The buckling part can comprise an elastic auxiliary arm formed between the elastic arm and the main body used for improving the elastic intensity of the elastic buckling arm. By adopting the cleaning container buckling structure of the invention, the quantity of the buckling parts can be reduced, can be directly positioned on the cover body and form self-locking after buckling the seat body and increase elastic components.

Description

technical field [0001] The invention relates to a fastening structure of a container, in particular to a self-locking fastening structure applied to a clean container in a clean room. Background technique [0002] For general clean containers, no matter it is a photomask storage box, a wafer storage box or a glass substrate storage box, etc., the interior usually contains a photomask, a wafer or a glass substrate, which is suitable for use in semiconductor manufacturing processes. Covers, chips or glass substrates have extremely high requirements for ultra-clean storage environments to strictly prevent them from being polluted by fine dust particles, as well as being affected by static electricity or electrostatic fields. Today's semiconductor process requirements must reach Class 1 or above. Therefore, photomasks, wafers or glass substrates must be processed in an ultra-high clean and dust-free environment in general semiconductor manufacturing plants or flat-panel display ...

AI Technical Summary

Problems solved by technology

And this prior art and Figure 1A Like the existing technology, there are too many dead angles between the fastening parts and the metal cover, which is not only easy to accumulate fine dust, but also not conducive to the cleaning and drying of the mask box.

This prior art will also increase the number of parts (the total number of parts is 14 in the fastening mechanism), which is not very ideal

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