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Measuring method of angle deviation along azimuth axis direction and pitching angle deviation of laser emission axis and mechanical base level normal based on secondary light source

A technology of auxiliary light source and laser emission, applied in the field of measurement, which can solve the problems of measurement, angle deviation, pitch angle deviation, etc.

Inactive Publication Date: 2010-04-21
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In order to solve the problem that the angle between the laser emitting axis and the mechanical reference plane needs to be strictly measured in an optical test system with small beam divergence angle and high pointing control precision, and there is no way to measure it at present, the present invention proposes A method for measuring the angle deviation between the laser emission axis and the normal of the mechanical reference plane along the direction of the azimuth axis and the deviation of the pitch angle based on the auxiliary light source

Method used

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  • Measuring method of angle deviation along azimuth axis direction and pitching angle deviation of laser emission axis and mechanical base level normal based on secondary light source
  • Measuring method of angle deviation along azimuth axis direction and pitching angle deviation of laser emission axis and mechanical base level normal based on secondary light source
  • Measuring method of angle deviation along azimuth axis direction and pitching angle deviation of laser emission axis and mechanical base level normal based on secondary light source

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specific Embodiment approach 1

[0013] Specific implementation mode one: combine Figure 1-5 Describe this embodiment, the steps of this embodiment are as follows:

[0014] Step 1: Detect the exit spot of the laser emission system 9 under test: the laser emission system 9 under test emits a laser beam, the laser beam is focused by the telephoto collimator 1, and after focusing, the measured laser beam is irradiated on the light outlet of the telephoto collimator 1 On the 1:1 beam splitter 3 between the focal point, 50% of the measured laser beam is reflected by the beam splitter 3 and focused on the CCD detector 4, and the position of the imaging spot is recorded as A(x 1 ,y 1 ), another 50% of the measured laser beam forms a point image on the imaging screen 5, and the spot position is recorded by the microscopic CCD detector 7;

[0015] Step 2: Install the pinhole diaphragm: turn off the laser emitting system, remove the imaging screen 5, replace the shading plate 6 with the pinhole, and accurately adjus...

specific Embodiment approach 2

[0020] Specific embodiment two: the difference between this embodiment and specific embodiment one is that the center position of the small hole of the light shielding plate 6 is adjusted in the step 2, and the small hole is placed at the focal plane of the telephoto collimator 1. The CCD detector 7 monitors the position of the center of the pinhole while the position of the CCD detector 7 remains unchanged, and adjusts it at the same time so that the center of the pinhole of the shading plate 6 coincides with the position of the imaging spot of the emitted light path of the measured laser emitting system 9 . Other components and steps are the same as those in Embodiment 1.

specific Embodiment approach 3

[0021] Embodiment 3: This embodiment differs from Embodiment 1 in that the telephoto collimator 1 has a focal length of 12 m and an aperture of 400 mm. Other components and steps are the same as those in Embodiment 1.

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Abstract

A method is provided to measure the coaxiality between a laser emission shaft and a mechanical reference surface based on a secondary light source. The invention relates to the measurement field and solves the problem that no method is available for accurately measuring the included angle between the laser emission shaft and the mechanical reference surface in an optical test system with small beam divergence angle and strict requirement for pointing control accuracy. The method comprises the following steps of: firstly detecting emergent light spots of a laser emission system to be measured;then installing a minipore light diaphragm; installing a secondary light source for the detection of reflected light spots; and finally calculating the directional angular deviation and the pitch angledeviation. Based on the secondary light source and a beam splitting system, the invention can increase the measurement accuracy up to 0.1 Mu rad by the focal plane imaging method, and also can preven t the minimal measurement range being limited by the size of light spots.

Description

technical field [0001] The invention relates to the field of measurement, in particular to a method for measuring the angular deviation between the laser emission axis and the normal of a mechanical reference plane along the direction of the azimuth axis and the deviation of the pitch angle based on an auxiliary light source. Background technique [0002] When the laser emission system is installed on the mechanical bearing platform, it is required that the laser emission axis is precisely aligned with the normal line of the reference plane of the bearing platform, which requires that the laser emission axis and the normal line of the mechanical reference plane can be aligned along the azimuth axis direction during the installation process. High-precision measurement of angle deviation and pitch angle deviation. At present, most optical systems do not have strict requirements on the angle difference between the optical axis and the mechanical axis, and do not need to measure...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/26
Inventor 谭立英马晶韩琦琦刘剑峰于思源杨玉强俞建杰
Owner HARBIN INST OF TECH