High heat-resistance hollow out substrate working platform capable of multiple-surface depositing CVD diamond film

Abstract

The invention discloses a high heat resistant hollow substrate worktable which can deposit CVD diamond films in a plurality of facets in view of the problems of the inconsistence of temperature fields and reaction gas flow fields on a substrate side along the thickness direction, high residual stress and bad thickness uniformity of deposited CVD diamond films, etc., caused by initially slow temperature rising and fast cooling existing in present compulsory cooling worktables; wherein, the invention is characterized in that screens (2) are positioned inside an upper frame (1) which is connected with a bearing (4) through a bracket (3), and a substrate (6) used for depositing the CVD diamond films is uniformly placed on the screens (2), and a plane for placing the substrate (6) on the screens (2) is parallel with a lower bottom surface of the bearing (4); the invention ensures that the substrate temperature rises rapidly when the diamond is deposited at the beginning and the substrate temperature falls slowly when the deposition of the diamond is over, which improves the uniformity of the reaction gas flow field; the thickness and quality of the diamond films of substrate sides and upper surfaces deposited on the substrate worktable are consistent and the residual stress of the CVD diamond films is reduced, which is especially suitable for the surface deposition of hard alloy cutting tools.

Description

Technical field

[0001] The invention relates to a worktable used in the deposition process of a CVD diamond film, in particular a high thermal resistance worktable, specifically a worktable which can improve the uniformity of the flow field of reaction gas, and is prepared on the side of a substrate and on the substrate. A CVD diamond film with uniform surface quality and a high thermal resistance hollow substrate worktable capable of depositing CVD diamond film on multiple sides and its application. Background technique

[0002] At present, the mechanical, thermal, acoustic, electrical, optical and chemical properties of chemical vapor deposition (CVD) diamond have reached or approached the performance of natural diamond, and it has broad application prospects in today's high-tech fields. The hot filament CVD method for preparing diamond films has the advantages of faster growth speed, lax control requirements for growth conditions, wide pressure range of the reaction chamber, l...

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