Fluid control apparatus

Abstract

The fluid control device according to the present invention is characterized by comprising: a fluid control valve that controls the flow rate of the fluid by changing the opening area of ​​the flow channel; a flow measuring device that converts and outputs an electrical signal; and a control unit that controls the opening area of ​​the fluid control valve based on the deviation between the electrical signal from the flow measuring device and a set flow rate The command signal is output to the fluid control valve or the device that operates the fluid control valve.

Description

technical field [0001] The present invention relates to a fluid control device used in fluid transfer piping that requires fluid control. More specifically, it is mainly related to easy installation, piping and wiring connection in semiconductor manufacturing equipment, flow control can be performed without problems even if pulsating fluid flows, and stable and high-precision accuracy can be achieved in a large flow range. A fluid control device for flow control. Background technique [0002] Conventionally, as one of the semiconductor manufacturing processes, wet etching is used to etch the surface of a wafer using cleaning water obtained by diluting a chemical solution such as hydrofluoric acid with pure water. The concentration of cleaning water for these wet etching must be managed with high precision. In recent years, the method of controlling the concentration of cleaning water based on the flow rate ratio of pure water and chemical solution has become mainstream. Th...

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Problems solved by technology

[0005] However, the above-mentioned existing pure water flow control device 301 balances the output pressure of the pure water in the flow regulating valve 302, thereby controlling the pure water flow output from the flow regulating valve 302 to be constant. Therefore, It cannot be used to finely control the flow rate, and the flow range is not wide enough, so there is a problem that it is difficult to control the flow rate in a wide flow range

In addition, since there are multiple components, when installing them in semiconductor manufacturing equipment, etc., it is necessary to perform piping connection work, electrical wiring, and air piping work for each component separately. The work is complicated and time-consuming, and the piping and wiring may be complicated. error occurred

[0006] In addition, for the above-mentioned existing flow control module 306, when the fluid flowing into the fluid control device is a pulsating fluid with a short pressure fluctuation period, the control valve 308 operates to control the flow of the pulsating fluid, but there are fluctuations, The problem of not being able to control the flow rate, if it still persists, there is also a problem that the driver 311 and the control valve 308 may be damaged

In addition, since the flow rate range for flow control is not wide, there is a problem that it is difficult to use it for the purpose of controlling the flow rate in a large flow rate range.

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