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Lithography system and projection method

A lithography system and projection technology, applied in the field close to or in the range of the projection space, can solve problems such as non-optimal aberrations

Inactive Publication Date: 2008-10-29
MAPPER LITHOGRAPHY IP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Although the general configuration of the lithographic system described above has proven satisfactory, since it suffers from a non-optimal (at least less than expected) transmission of light and because it suffers from relatively large aberrations, it is noted that the disclosed tilt Defects in the lighting system

Method used

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  • Lithography system and projection method
  • Lithography system and projection method
  • Lithography system and projection method

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Embodiment Construction

[0019] Figure 1 shows a general side view of a prior art lithographic system modified by the present invention, wherein at the modulation means end 2 of the light emitter or light carrier Fb, in particular an optical fiber Fb, using An optical system, represented by lens 54 , projects light beam 8 onto modulator array 24 . The modulated light beam 8 from each optical fiber end is projected onto a photosensitive element, ie a photosensitive part of each modulator of said modulator array 24 . Specifically, each end of the fiber Fb is projected onto the modulator array. Each beam 8 has a portion of pattern data for controlling one or more modulators, the modulation of which forms a signaling system for communicating modulator array instructions based on the pattern data to achieve the desired image on said target surface .

[0020] Figure 1 also shows a beam generator 50 which produces a diverging beam 51 of charged particles (in this example an electron beam). Using an optica...

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Abstract

The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said controlunit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

Description

technical field [0001] The present invention relates to a lithographic system for projecting an image pattern (image pattern) onto a target surface such as a wafer, wherein control data is coupled to a control unit to control the exposure projection by optical signals, thereby using free space interaction Connect (free space interconnect, free space interconnect), in particular to a system in which such a control unit is contained in close proximity or within the confines of the projection space, and more particularly to a multi-beam maskless lithography system. The present invention generally still relates to charged particle and light projection based lithographic systems. Background technique [0002] Such systems are known, for example, from the international patent publication WO2004038509 filed in the applicant's name, ie from the detailed description provided by FIG. 14 thereof. This known system comprises a computer system for providing pattern data of an image to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01J37/317
CPCG03F7/2014G03F7/70191G03F7/70208G03F7/70258G03F7/70291G03F7/70383G03F7/70508G03F7/70841G03F7/70991
Inventor 马尔科·扬·哈科·威兰斯泰恩·威廉·卡雷尔·赫尔曼·斯腾布林克吉多·德布尔雷姆科·亚赫奥谢·阿里安内·安妮特·卡斯特利杰恩
Owner MAPPER LITHOGRAPHY IP
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