Deionized water nozzle device and its spraying and brushing method
A technology of deionized water and nozzle device, which is used in the processing of photosensitive materials, etc.
Active Publication Date: 2011-02-16
K TRONICS (SUZHOU) TECH CO LTD +1
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Problems solved by technology
[0007] The object of the present invention is to provide a deionized water nozzle device and its spraying method, which can effectively solve the problem of insufficient spraying ability of the prior art and easy residue of impurities on the lower end of the glass substrate. and other technical defects
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[0026] figure 1 It is a schematic diagram of the structure of the present invention. Such as figure 1 As shown, the main structure of the deionized water nozzle device of the present invention includes a main pipe 10, branch pipes 20 and nozzles 30, one end of several branch pipes 20 is connected to the main pipe 10 in turn, and the other end is connected to several nozzles 30, and the deionized water It is transported from the main pipeline 10 to several branch pipelines 20, and finally sprayed onto the surface of the glass substrate 40 by several nozzles 30 to realize the cleaning of residual photoresist glue or stripper residue. In actual production, as the size of the glass substrate increases, the number of main pipes and branch pipes can be set according to needs. The main pipe can be one or several, and the number of branch pipes connected to each main pipe is 6 to 10. There are 10-16 nozzles arranged on each sub-pipeline. figure 1 Only the technical scheme of one...
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The inventions relates to a deionized water nozzle device and a spraying method thereof. The nozzle device comprises a plurality of branch pipelines which are connected with a main pipeline; wherein, each of the branch pipelines is provided with a plurality of nozzles which are successively arranged; at least the nozzles on one of the branch pipelines are sideling nozzles, the nozzle direction ofwhich deviates from the vertical direction, while the nozzels on the other branch pipelines are straight nozzles, the nozzle direction of which is vertical downwards. The spraying method comprises: deionized water with temperature of from 40 DEG C to 60 DEG C is filled into the main pipeline; the deionized water enters the branch pipelines; the straight nozzels on the branch pipelines which are positioned above the higher end of a glass substrate sprays the deionized water to the glass substrate in the vertical downward direction; the sideling nozzels on the branch pipelines which are positioned above the lower end of the glass substrate sprays the deionized water to the glass substrate in a direction of 10 degrees to 30 degrees deviating from vertical direction. The nozzle device and thespraying method can enhance the ability of removing the light blockage adhesive and the stripping agents through changing the spraying method and the temperature of the deionized water.
Description
technical field [0001] The invention relates to a device and a process in the production of an LCD array, in particular to a deionized water nozzle device and a spraying method used in an IPA section wet stripping process. Background technique [0002] In the production of semiconductor and LCD arrays, the wet stripping (Wet Strip) process is a process after the etching process, which refers to the removal of the remaining photoresist (also known as PR glue) on the glass substrate. After the step of removing the photoresist by using a stripper solution, the glass substrate is sent to an isopropyl alcohol (IPA) section for cleaning. The IPA area is currently cleaned with deionized water (DI water). The purpose is to use deionized water to remove the photoresist and stripper residue on the glass substrate to ensure the cleanliness of the glass substrate. [0003] Figure 4 It is a structural schematic diagram of a deionized water nozzle device in the prior art, which is used ...
Claims
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IPC IPC(8): G03F7/42
Inventor 曹占锋
Owner K TRONICS (SUZHOU) TECH CO LTD