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Fused silica transmission 1*3 polarization irrelevant beam-splitting grating for 785 nanometer waveband

A technology of fused silica and beam splitting grating, applied in diffraction grating, optics, opto-mechanical equipment, etc., to achieve the effect of mature technology and low cost

Inactive Publication Date: 2009-01-07
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But as far as we know, so far, no one has given a high-density deep-etched fused silica high-efficiency transmission 1×3 polarization-independent beam-splitting grating for the commonly used 785 nm wavelength band

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  • Fused silica transmission 1*3 polarization irrelevant beam-splitting grating for 785 nanometer waveband
  • Fused silica transmission 1*3 polarization irrelevant beam-splitting grating for 785 nanometer waveband
  • Fused silica transmission 1*3 polarization irrelevant beam-splitting grating for 785 nanometer waveband

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Embodiment Construction

[0016] The present invention will be further described below in conjunction with the embodiments and accompanying drawings.

[0017] The basis of the present invention is as follows:

[0018] figure 1 The geometry of a high-density rectangular deeply etched quartz beamsplitter grating is shown. In the figure, 1 represents area 1 (refractive index n 1 ), 2 represents area 2 (refractive index n 2 ), 3 represents grating, 4 represents incident light, 5 represents 0-order diffracted light, 6 represents -1-order diffracted light, 7 represents 1-order diffracted light, Λ represents grating space period, h represents grating groove depth, b represents grating protrusion The width of (duty cycle f = b / Λ).

[0019] Regions 1 and 2 are uniform, respectively air (refractive index n 1 =1) and fused silica (refractive index n 2 = 1.453596). The grating vector K lies in the plane of incidence. The vibration direction of the TE polarized incident light corresponding to the electric f...

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Abstract

The invention relates to a fused silica transmission 1*3 polarization-independent beam-splitting grating used in 785-nanometer wave band, which is a rectangular high-density deep-etched grating. The grating has a cycle of 1064 - 1072 nanometers, an etching depth of 2.580 - 2.602 microns and a duty cycle of 0.5. The grating can enable the efficiency of 0-level diffraction and plus or minus 1-level diffraction of TE polarized light to be respectively 32.47 percent and 32.51 percent, the efficiency of 0-level diffraction and plus or minus 1-level diffraction of TM polarized light to be respectively 32.95 percent and 32.97 percent, and the total diffraction efficiency to be up to 97 percent. Furthermore, the grating can realize comparatively perfect high-efficiency 1*3 beam splitting to the TE polarized light and the TM polarized light.

Description

technical field [0001] The invention relates to a 1*3 polarization-independent beam-splitting device, in particular to a high-efficiency fused silica transmission 1*3 polarization-independent beam-splitting grating used in the 785 nanometer wave band. Background technique [0002] Beam splitters are widely used in various optical systems, which can split a beam of incident light into several beams of outgoing light with equal energy. Traditional beam splitters based on multi-layer dielectric films have large energy losses, complex manufacturing processes, and high costs. Photonic crystals, which have emerged in recent years as beam splitters, also have disadvantages such as high cost and difficult manufacture. Some literatures have reported high-density phase gratings as beam splitters, but they are mainly used as 1×2 beam splitting devices and are polarization-dependent. However, the traditional Damman grating beam splitter that can be used as a 1×3 beam splitting device ...

Claims

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Application Information

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IPC IPC(8): G02B5/18G03F7/00
Inventor 周常河冯吉军
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI