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Charging room for chemical vapor deposition device

A chemical vapor deposition, loading chamber technology, applied in gaseous chemical plating, electrical components, coatings, etc., can solve problems such as poor process and influence, and achieve the effects of improving productivity, reducing manufacturing, and reducing bending

Inactive Publication Date: 2009-05-27
SFA ENG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As a result, the particles can be produced from the joint between the upper wall 22, the lower wall 24, the partition wall 25 and the side wall 26 forming the cavity 21, or from the joint between the cavity 21 and the bracket joint 27. Produced by the Ministry, so it will have a bad influence on the process

Method used

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  • Charging room for chemical vapor deposition device
  • Charging room for chemical vapor deposition device
  • Charging room for chemical vapor deposition device

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Embodiment Construction

[0047] The present invention has been claimed at the Korea Intellectual Property Office by filing Korean Patent Application No. 10-2007-0119236 on November 21, 2007, Korean Patent Application No. 10-2007-0131150 on December 14, 2007, and The advantages of Korean Patent Application No. 10-2008-0027927 filed on March 26, 2008 are disclosed in full as follows.

[0048] The accompanying drawings are used to illustrate the embodiments of the present invention, and are cited to gain a sufficient understanding of the present invention and its advantages. Hereinafter, embodiments of the present invention are explained and described in detail with reference to the accompanying drawings. And the same reference element number refers to the same element.

[0049] The following description is for reference. A substrate mentioned below may refer to a flat panel display, including a liquid crystal display (LCD) substrate, a plasma display panel (PDP) substrate and an organic light emitting ...

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Abstract

The invention relates to a load chamber for chemical vapor deposition, comprising a cavity body having plural single-group chambers containing a substrate therein and plural grooves for inputting and outputting the substrate formed at one side surface and the other side surface in relation to the single-group chamber; and at least one reinforcing plate at least connected to one side surface and the other side surface of the chamber body having grooves. The strength of the chamber body is reinforced to avoid a bending stress generated as a result of pressure difference between the single-group chambers.

Description

technical field [0001] The invention relates to a loading chamber, in particular to a loading chamber for chemical vapor deposition equipment which can minimize structural deformation by strengthening the strength of the structure to avoid bending stress caused by pressure difference. Background technique [0002] Flat panel displays have been widely used in television products, computer screens, or personal portable terminals. The flat panel display may include a liquid crystal display (liquid crystal display, LCD), a plasma display panel (plasma display panel), and an organic light emitting diode (organic light emitting diode). Among these flat-panel displays, liquid crystal displays inject liquid crystals, which are intermediate substances between solid and liquid, into the space between the upper and lower glass substrates of two thin plates, and use an optical switching phenomenon to display numbers or images. , and the voltage difference between the upper and lower gl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44
CPCC23C16/54H01L21/67201
Inventor 李相琝朴相泰
Owner SFA ENG CORP
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